Plasma Polymer Membranes for Immobilising Metalloporphyrins

Boscher, Nicolas D.; Duday, David; Heier, Philip; Heinze, Katja; Hilt, Florian; Choquet, Patrick

doi:10.1002/ppap.201200132

Cited by 24 publications

(32 citation statements)

References 39 publications

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“…Due to the extremely low volatility of porphyrins, their use in CVD processes has always been a challenge, and considerably restrained the exploitation of their remarkable properties. Sublimation under low‐pressure conditions can allow the delivery of porphyrins to a surface .…”

Section: Resultsmentioning

confidence: 99%

Conductive Directly Fused Poly(Porphyrin) Coatings by Oxidative Chemical Vapour Deposition – From Single‐ to Triple‐Fused

et al. 2019

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While the solution‐phase synthesis of directly fused porphyrin tapes has been successfully developed in recent years, the deposition of these promising compounds in thin film form has remained a challenge. In this study, we report the simultaneous synthesis and deposition of conductive directly fused poly(porphyrin) coatings based on a substrate independent and up‐scalable oxidative chemical vapor deposition (oCVD) approach. A particular emphasis is given to the selection and sublimation conditions of the oxidant. The direct fusion of nickel(II) 5,15‐(diphenyl)porphyrin (NiDPP) is successfully achieved using three different oxidants, namely iron(III) chloride (FeCl3), copper(II) chloride (CuCl2) and copper(II) perchlorate hexahydrate (Cu(ClO4)2·6H2O). FeCl3 is demonstrated as the most suitable oxidant, allowing the formation of mainly singly‐fused poly(NiDPP) or conductive mainly doubly or triply‐fused poly(NiDPP) that strongly absorb in the NIR. High‐resolution mass spectrometry evidences the chlorination of the formed compounds as a side reaction. This chlorination can either be considered as a drawback by preventing the formation of large directly fused NiDPP oligomers or as an asset when targeting the formation of fully insoluble directly fused poly(NiDPP) coatings. Overall, the described oCVD approach opened up the possibility to tune the band gap, conductivity, and solubility of directly fused P(NiDPP) coatings.

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Section: Resultsmentioning

confidence: 99%

Conductive Directly Fused Poly(Porphyrin) Coatings by Oxidative Chemical Vapour Deposition – From Single‐ to Triple‐Fused

et al. 2019

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“…Thanks to hybrid character of HMDSO the films can be deposited in different forms, polydimethylsiloxane (PDMS)‐like or SiO 2 ‐like, depending on the plasma parameters . The coatings have been used for change of surface wettability, corrosion protection, gas barrier, or gas sensing …”

Section: Introductionmentioning

confidence: 99%

Plasma Enhanced CVD of Organosilicon Thin Films on Electrospun Polymer Nanofibers

Kedroňová

Zajı́čková

Hegemann

et al. 2015

Plasma Process. Polym.

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Organosilicon plasma polymers were deposited on polyvinyl alcohol and polyamide 6 electrospun nanofibers from hexamethyldisiloxane/Ar mixtures in low pressure (LP) radio frequency (RF) discharges with capacitive coupling and by cold RF plasma multi-jets working at atmospheric pressure (AP). The chemistry of the films deposited at LP was significantly varied by changing the RF power and process pressure as studied by X-ray photoelectron spectroscopy and Fourier transform infrared spectroscopy. Both the gas phase and surface processes contributed to the observed differences in the film properties. Significant variations in the nano/microstructure of the plasma polymers prepared by plasma processes at two different pressures were revealed by Atomic force microscopy and Scanning electron microscopy analysis. Modifications of the fibrous materials were investigated with respect to the wettability and structural properties. The values of the water contact angle were strongly influenced by both, the chemical composition of the deposited layers and the overall surface structure.

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“…Furthermore, it could provide conformal surface coatings with tailored physical and chemical properties on sensitive and complex substrates. [23][24][25][26][27][28][29][30] This pulsed-PECVD, where the power is modulated for durations from micro-to milliseconds, decreases the total power density delivered to the plasma and short plasma pulses (ms to ms) can activate vinyl-, allyl-or acrylic monomer molecules. Recently, a new PECVD process has been developed to deposit a phosphatebased polymer at atmospheric pressure.…”

Section: Introductionmentioning

confidence: 99%

Plasma polymerisation of an allyl organophosphate monomer by atmospheric pressure pulsed-PECVD: insights into the growth mechanisms

et al. 2015

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Atmospheric plasma deposition of DiEthylAllyl Phosphate (DEAP) has been performed to study the behaviour of an allylic phosphate-based monomer in a nitrogen Atmospheric Pressure-Dielectric Barrier Discharge (AP-DBD). The deposition kinetics and chemical structures of the different coatings have been studied as a function of the duty cycle and the power dissipated in the discharge. It has been highlighted that it is possible to obtain different chemistries, from organic coatings in which the monomer structure is remaining to inorganic polyphosphate-based ones. Different mechanisms of deposition have been outlined and discussed taking into account the deposition kinetics, the coatings chemistries and the monomer reactivity in the gas phase.

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Plasma Polymer Membranes for Immobilising Metalloporphyrins

Cited by 24 publications

References 39 publications

Conductive Directly Fused Poly(Porphyrin) Coatings by Oxidative Chemical Vapour Deposition – From Single‐ to Triple‐Fused

Conductive Directly Fused Poly(Porphyrin) Coatings by Oxidative Chemical Vapour Deposition – From Single‐ to Triple‐Fused

Plasma Enhanced CVD of Organosilicon Thin Films on Electrospun Polymer Nanofibers

Plasma polymerisation of an allyl organophosphate monomer by atmospheric pressure pulsed-PECVD: insights into the growth mechanisms

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