Plasma polymerisation of an allyl organophosphate monomer by atmospheric pressure pulsed-PECVD: insights into the growth mechanisms

Abstract

Atmospheric plasma deposition of DiEthylAllyl Phosphate (DEAP) has been performed to study the behaviour of an allylic phosphate-based monomer in a nitrogen Atmospheric Pressure-Dielectric Barrier Discharge (AP-DBD). The deposition kinetics and chemical structures of the different coatings have been studied as a function of the duty cycle and the power dissipated in the discharge. It has been highlighted that it is possible to obtain different chemistries, from organic coatings in which the monomer structure is remaining to inorganic polyphosphate-based ones. Different mechanisms of deposition have been outlined and discussed taking into account the deposition kinetics, the coatings chemistries and the monomer reactivity in the gas phase.

Influence of a square pulse voltage on argon-ethyl lactate discharges and their plasma-deposited coatings using time-resolved spectroscopy and surface characterization

“…Other studies made with polymerizable precursors such as acrylates showed that longer time off could induce radical polymerization and hence smoother coatings [2][3][4]. This was not observed in this study since the chemical structure of ethyl lactate cannot enable conventional polymerization.…”

“…Over the last decade, many studies have examined the influence of pulse input signals on the plasma polymerization dynamics [1][2][3][4]. The general observation is that, thanks to their short but strong discharge current peaks accompanied by long time off, pulse discharges usually lead to a more chemically conventional polymerization, which minimize plasma-induced crosslinking effects.…”

Kinetics driving thin-film deposition in dielectric barrier discharges using a direct liquid injector operated in a pulsed regime

“…In addition to Yasuda's parameter, the plasma deposition kinetics and precursor polymerization dynamics depend on the plasma power injection controlled, for example, by the plasma-on time (duty cycle) [18][19][20]. In such pulsed plasma conditions, Manakhov et al [19] proposed that plasma-assisted deposition occurs only during plasma-on time, whereas free radical polymerization occurs during plasma-off time.…”

Efficient Flame Retardant Thin Films Synthesized by Atmospheric Pressure PECVD through the High Co-deposition Rate of Hexamethyldisiloxane and Triethylphosphate on Polycarbonate and Polyamide-6 Substrates

“…(P−O−P), ν s. (P−O) in P−OH , and ν(PO) at 927 cm −1 , 1061 and 1209 cm −1 , respectively. 19,21 In comparison to the ppTEP FT-IR spectrum, no evidence of a phosphorus signature is observed in the FT-IR spectra of the coatings elaborated from both monomers. Only a weak peak would seem to appear around 580 cm −1 , which is typical of the bending vibration δ(P−O).…”

“…No vacuum system is required in comparison with low-pressure plasmas, and no heating systems are needed, as in classical CVD. Moreover, this technique has been widely used to grow organosilicon coatings, , and recent papers report its use to deposit phosphorus-containing thin films. − …”