Plasma Synthesis of Nanoparticles

Vollath, D.

doi:10.14356/kona.2007007

Cited by 46 publications

(19 citation statements)

References 23 publications

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“…In this manner, one can obtain high purity metallic particles from inexpensive and easily available bulk materials. High‐temperature plasma processes driven by high power torches at atmospheric pressure are the most common, however, the agglomeration of particles appears as a main disadvantage . Low temperature plasma processes, where charging of particles prevents agglomeration, are also of interest but normally they proceed at reduced pressure, thus, the requirement of expensive vacuum systems impeded on their usage on large scale.…”

Section: Introductionmentioning

confidence: 99%

Synthesis of Copper Particles by Non‐thermal Atmospheric Pressure Plasma Jet

Lazea-Stoyanova

Vlad

Vlaicu

et al. 2015

Plasma Processes & Polymers

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The present study reveals the synthesis of metallic particles at atmospheric pressure using a radiofrequency low‐temperature argon plasma jet. Copper bulk material of the powered electrode acted as solid precursor in the process and the metallic particles were obtained directly in gaseous environment. The particles were collected onto Si (100)‐oriented substrates downstream of the atmospheric plasma jet and were ex situ characterized via optical microscopy, scanning electron microscopy, X‐ray diffraction, and energy‐dispersive X‐ray spectroscopy. We obtained copper particles, reddish brown in color, either of nano‐ or micro‐metric sizes. Additionally, the plasma species and gas temperature were determined by OES. In conclusion, it was demonstrated that conversion of bulk metals into particles is possible at atmospheric pressure using a radiofrequency plasma jet and the development of several applications is recommended.

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Section: Introductionmentioning

confidence: 99%

Synthesis of Copper Particles by Non‐thermal Atmospheric Pressure Plasma Jet

Lazea-Stoyanova

Vlad

Vlaicu

et al. 2015

Plasma Processes & Polymers

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“…flame synthesis (Wegner and Pratsinis, 2000), thermal evaporation (Granqvist and Buhrman, 1976), and plasma synthesis (Vollath, 2007;Binns, 2001). The technique presented in this article is a plasma-based technique based on high-power pulses similar to what is used in the HiPIMS discharge.…”

Section: Nanoparticle Synthesismentioning

confidence: 99%

The use of Highly Ionized Pulsed Plasmas for the Synthesis of Advanced Thin Films and Nanoparticles

Pilch¹,

Söderström²,

Lundin

et al. 2014

KONA

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Pulsed plasma processes open up the possibility of using very high plasma densities and modulated deposition in the synthesis of thin films and nanoparticles. The high plasma densities lead to a high degree of ionization of the source material, which creates new possibilities for surface engineering. Ions can, in contrast to atoms, be easily controlled with regard to their energy and direction, which is beneficial for thin film growth. Furthermore, ions can also increase the trapping probability of material on nanoparticles growing in the gas phase. The pulsed sputter ejection of source material also has other consequences: the material in the plasma and the material arrival on the growth surface will fluctuate strongly resulting in high level of supersaturation during pulse-on time. In this paper, an overview of the generation and properties of highly ionized pulsed plasmas is given. In addition, the use and importance of these types of discharges in the fields of thin-film and nanoparticle growth are also summarized.

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“…The aim of the present work is to explore the impurity chemistry and surface passivation of the Cu nanopowders as a function of the operating conditions in a DC thermal plasma synthesis. Among other gas-phase processes for the fabrication of nanopowders, the thermal plasma synthesis [15,16] delivers greater flexibility in creating chemically diverse working environments by appropriate choice of the plasma-forming gas and the feedstock. However, these processing capabilities remain largely untapped as an effective means of taking control over the product purity and passivation.…”

Section: Introductionmentioning

confidence: 99%