Plasmachemische Gasphasenabscheidung – eine Technologie zur Deposition organischer und anorganischer Schichten. Plasma Enhanced Chemical Vapor Deposition – a Thin Film Technique for Organic and Inorganic Layers

Schade, K.; Stahr, F.; Steinke, O.; Stephan, U.

doi:10.1002/vipr.200500253

Cited by 5 publications

(2 citation statements)

References 5 publications

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“…The resultant gases are then in a chemical state more conducive to growth of nanowires at the substrate. The primary rationale for using PECVD is to circumvent damage to temperature‐sensitive substrates [250] . PECVD is widely used in the microelectronics industry to deposit coatings onto silicon wafers that have been doped with precise quantities of selected elements.…”

Section: Gas‐phase Synthesismentioning

confidence: 99%

“…Silicon nanowires grown via VLS in a CVD reactor exhibited subtle differences in tapering from root to tip depending on whether silane (SiH 4 ) or dichlorosilane (SiH 2 Cl 2 ) was used. [250] In their study, it was discovered from use of dichlorosilane that the HCl byproduct etched the sidewalls of the nanowires thereby leading to narrower diameters away from the catalyst tip. An opposite trend was observed with use of silane from slow concurrent VS-growth on the sidewalls.…”

Section: Precursor Typementioning

confidence: 99%

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A Review on 1‐D Nanomaterials: Scaling‐Up with Gas‐Phase Synthesis

Chrystie

2023

The Chemical Record

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Nanowire‐like materials exhibit distinctive properties comprising optical polarisation, waveguiding, and hydrophobic channelling, amongst many other useful phenomena. Such 1‐D derived anisotropy can be further enhanced by arranging many similar nanowires into a coherent matrix, known as an array superstructure. Manufacture of nanowire arrays can be scaled‐up considerably through judicious use of gas‐phase methods. Historically, the gas‐phase approach however has been extensively used for the bulk and rapid synthesis of isotropic 0‐D nanomaterials such as carbon black and silica. The primary goal of this review is to document recent developments, applications, and capabilities in gas‐phase synthesis methods of nanowire arrays. Secondly, we elucidate the design and use of the gas‐phase synthesis approach; and finally, remaining challenges and needs are addressed to advance this field.

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Section: Gas‐phase Synthesismentioning

confidence: 99%

Section: Precursor Typementioning

confidence: 99%

A Review on 1‐D Nanomaterials: Scaling‐Up with Gas‐Phase Synthesis

Chrystie

2023

The Chemical Record

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Abscheidung, Charakterisierung und Anwendung von Plasma‐Polymerschichten auf HMDSO‐Basis

Jacoby¹,

Böck²,

Haupt³

et al. 2006

Vak Forsch Prax

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High quality organosilicone coatings can be produced via plasma enhanced chemical vapor deposition of hexamethyldisiloxane (HMDSO). In this article aspects of deposition, analysis and application of HMDSO/O2 processes are presented. The coatings' organic/inorganic character can be adjusted by an appropriate combination of plasma power and gas mixture which is shown by XPS. Particularly multi layer and gradient layer systems can be deposited within the same process. Quantitative chemical depth profiling of such layer systems can be performed by secondary neutral mass spectrometry (SNMS). AFM investigations exhibit that the surface roughness of the coatings is determined by the appearance of hemispherical agglomerates, which is more pronounced, the more glass-like the coatings are. As an example of use it is shown, that an appropriate HMDSO plasma treatment can distinctly improve the tribological behavior of elastomer devices. The presented work is done within a project of the German Federal Ministry of Education and Research (BMBF) entitled: "nano functionalization of interfaces for data-, textile-, building-, medicine-, bio-, and aerospace- technology"

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PECVD mit der Bandhohlkathode

et al. 2011

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Niederdruck‐Glimmentladungen sind für die Entwicklung neuartiger Oberflächenmodifikationen und ‐beschichtungen von Stahlfeinblechen von großem Interesse. Die Herausforderungen bei der Integration der Plasmaprozesse in vorhandene kontinuierliche Beschichtungsprozesse von Feinblech bestehen in der Notwendigkeit von sehr hohen Behandlungsraten und minimalen parasitären Ablagerungen. Unter Berücksichtigung dieser Anforderungen wurde auf Basis einer scheibenförmigen Hohlkathode, die von den Substraten selbst gebildet wird, ein neuartiges Bandhohlkathodenverfahren (Strip Hollow Cathode – SHC) für die Oberflächenbehandlung entwickelt. Dieses Verfahren hat hohes Potenzial für die kontinuierliche Behandlung von Stahlband, was anhand unterschiedlicher Anwendungsbereiche aufgezeigt wird.

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Plasmachemische Gasphasenabscheidung – eine Technologie zur Deposition organischer und anorganischer Schichten. Plasma Enhanced Chemical Vapor Deposition – a Thin Film Technique for Organic and Inorganic Layers

Cited by 5 publications

References 5 publications

A Review on 1‐D Nanomaterials: Scaling‐Up with Gas‐Phase Synthesis

A Review on 1‐D Nanomaterials: Scaling‐Up with Gas‐Phase Synthesis

Abscheidung, Charakterisierung und Anwendung von Plasma‐Polymerschichten auf HMDSO‐Basis

PECVD mit der Bandhohlkathode

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