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Results for a new 60 MHz plasma‐enhanced chemical vapour deposition (PECVD) apparatus developed for roll‐to‐roll processes of polymeric substrates are presented. Using silicon organic precursors in an oxygen plasma, thin film properties could be varied from inorganic silicon oxide to siloxane plasma polymers by varying the precursor content or by pulsing the plasma without changing the gas composition. The transition from inorganic oxide to plasma polymer was investigated by infrared spectroscopy and contact angle measurements. A process was introduced to produce an inorganic‐plasma polymer multilayer.

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