Plasmonic nano lithography  with a high scan speed contact probe

Kim, Yongwoo; Kim, Seok; Jung, Howon; Lee, Eungman; Hahn, Jae Won

doi:10.1364/oe.17.019476

Cited by 79 publications

(51 citation statements)

References 38 publications

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“…Prospective applications of such nano-SILs include near-field focusing and imaging 12 , optical data storage 26 , and maskless direct-write lithography 27 . Furthermore, the introduction of plasmonic structures on the bottom of the SIL could further improve performance and resolution 28 .…”

Section: Resultsmentioning

confidence: 99%

Optical characterization of subwavelength-scale solid immersion lenses

Kim

Scharf

Haq

et al. 2012

Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V

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We present the fabrication and optical characterization of nano-scale solid immersion lenses (nano-SILs) with sizes down to a subwavelength range. Submicron-scale cylinders fabricated by electron-beam lithography (EBL) are thermally reflowed to form a spherical shape. Subsequent soft lithography leads to nano-SILs on transparent substrates, i.e. glass, for optical characterization with visible light. The optical characterization is performed using a high-resolution interference microscope (HRIM) with illumination at 642 nm wavelength. The measurements of the 3D amplitude and phase fields provide information on the spot size and the peak intensity. In particular, the phase measurement is a more convincing proof of the Airy disc size reduction rather than the full-width at half maximum (FWHM) spot size. The focal spots produced by the nano-SILs show both spot-size reduction and enhanced optical intensity, which are consistent with the immersion effect. In this way, we experimentally confirm the immersion effect of a subwavelength-size SIL (d = 530 nm and h = 45 nm) with a spot reduction ratio of 1.35, which is less than the expected value of 1.5, most likely due to the slightly non-ideal shape of the nano-SIL.

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Section: Resultsmentioning

confidence: 99%

Optical characterization of subwavelength-scale solid immersion lenses

Kim

Scharf

Haq

et al. 2012

Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V

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“…Kim et al reported a plasmonic lithography technique with bowtie-shaped contact probes [98]. As illustrated in Fig.…”

Section: Spps Direct Writing Nanolithographymentioning

confidence: 99%

Super-Resolution Patterning and Photolithography Based on Surface Plasmon Polaritons

Liu

Duan

Peng

2013

Nanostructure Science and Technology

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With the developments of the nanoscale science and technology, the demand for fabrication of nanoscale patterns has been significantly increased. Photolithography has still been the most widely used microfabrication technique because of its ease of repetition, effective cost, and suitability for large-area fabrication. The diffraction limit, however, restricts single-exposure resolution to features with periods no smaller than half wavelength of the illuminating sources. To achieve nanometer feature sizes within the regime of diffraction physics, one straightforward method is to reduce the working wavelength by employing light sources of higher photon energy, such as extreme ultraviolet light (EUV), soft X-rays, or atomic wave packet [1][2][3][4]. The main drawbacks, however, are the drastic increase of complexity and cost for instrumentation and processing, including the developments of new sources, photoresist, and the optical components. Several alternative techniques, such as electron beam lithography [5][6][7][8][9], focused ion beam lithography [10][11][12][13][14], dip-pen lithography [15][16][17][18], and nanoimprint lithography [19][20][21][22], can also achieve nanoscale feature sizes; however, these methods require the introduction of a new infrastructure of tools, materials, and processing technologies, which costs huge expenses.Recently, a new photolithographic scheme, which is based on the unique properties of surface evanescent waves [23][24][25][26] or surface plasmon polaritons (SPPs) [27][28][29][30][31][32][33][34][35][36][37] induced at the interface between a metal and a dielectric material, to achieve sub-diffraction-limit nanopatterns was proposed and demonstrated. The wave vector of SPPs can be significantly larger than that of the free-space illuminating light at the same frequency, which results in extraordinary "optical frequency but X-ray wavelength" property. As a result, the resolution of this surface plasmon nanolithography can go far beyond the free-space diffraction limit of the light. Different versions of the implementation of the SPPs-based super-resolution nanolithography have been proposed and conducted both theoretically and experimentally in recent years, which all demonstrate that SPPs-based nanolithography has the potential to satisfy the requirements of high resolution, low cost, and high throughput simultaneously.

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“…Various maskless lithography techniques have been developed, such as plasmonic lithography [15], zone plate array lithography (ZPAL) [16,17], and nanoimprint lithography [18]. Among the various maskless lithography techniques, researchers have developed ML systems based on DMDs and subsequent applications since Chan et al had proposed a DMD-based ML system [8,9].…”

Section: Introductionmentioning

confidence: 99%

Detecting Digital Micromirror Device Malfunctions in High-throughput Maskless Lithography

Kang

Hahn

2013

Journal of the Optical Society of Korea

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Recently, maskless lithography (ML) systems have become popular in digital manufacturing technologies. To achieve high-throughput manufacturing processes, digital micromirror devices (DMD) in ML systems must be driven to their operational limits, often in harsh conditions. We propose an instrument and algorithm to detect DMD malfunctions to ensure perfect mask image transfer to the photoresist in ML systems. DMD malfunctions are caused by either bad DMD pixels or data transfer errors. We detect bad DMD pixels with 20×20 pixel by white and black image tests. To analyze data transfer errors at high frame rates, we monitor changes in the frame rate of a target DMD pixel driven by the input data with a set frame rate of up to 28000 frames per second (fps). For our data transfer error detection method, we verified that there are no data transfer errors in the test by confirming the agreement between the input frame rate and the output frame rate within the measurement accuracy of 1 fps.

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Plasmonic nano lithography  with a high scan speed contact probe

Cited by 79 publications

References 38 publications

Optical characterization of subwavelength-scale solid immersion lenses

Optical characterization of subwavelength-scale solid immersion lenses

Super-Resolution Patterning and Photolithography Based on Surface Plasmon Polaritons

Detecting Digital Micromirror Device Malfunctions in High-throughput Maskless Lithography

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Plasmonic nano lithography with a high scan speed contact probe

Cited by 79 publications

References 38 publications

Optical characterization of subwavelength-scale solid immersion lenses

Optical characterization of subwavelength-scale solid immersion lenses

Super-Resolution Patterning and Photolithography Based on Surface Plasmon Polaritons

Detecting Digital Micromirror Device Malfunctions in High-throughput Maskless Lithography

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Plasmonic nano lithography  with a high scan speed contact probe