Encyclopedia of Materials: Plastics and Polymers 2022
DOI: 10.1016/b978-0-12-820352-1.00163-2
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Plastics in Waveguide Application

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Cited by 4 publications
(3 citation statements)
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“…In this process, the film designed/patterned by etching is covered by another layer of pattern that is resistant to an etchant ( Figure 6 A,B). The layer to be patterned is the metal film, and the masking layer is often a designed/patterned photoresist film [ 145 ]. The etchants used for wet etching are classified into isotropic and anisotropic ( Figure 7 ).…”
Section: Techniques Of Preparation Of Mns (Mns)mentioning
confidence: 99%
“…In this process, the film designed/patterned by etching is covered by another layer of pattern that is resistant to an etchant ( Figure 6 A,B). The layer to be patterned is the metal film, and the masking layer is often a designed/patterned photoresist film [ 145 ]. The etchants used for wet etching are classified into isotropic and anisotropic ( Figure 7 ).…”
Section: Techniques Of Preparation Of Mns (Mns)mentioning
confidence: 99%
“…Recently, fast and low-cost holography techniques have been used to fabricate miniature optical devices (lenses, diffusers, and gratings) [18][19][20]. The soft lithography-based surface imprinting fabrication/replication method is relatively lower cost, with an uncomplicated setup, high throughput, and more appealing pattern resolution in the micro to the nanoscale with high precision [21,22].…”
Section: Introductionmentioning
confidence: 99%
“…The large number of hydroxyl groups on the EC backbone lends itself to chemical modification by oxidation, silylation, and electrostatic interaction reactions. Placing epoxy groups, amine groups, -SH, and hydroxyl groups at the ends and sides of the copolymer is essential for high temperature applications [31]. Modifying the surface of silica particles with -NH 2 and -SH groups is beneficial to the adsorption of nanoparticles, whereas modification with -CH 3 and -PPh 2 groups is not conducive to the adsorption of nanoparticles [32].…”
Section: Introductionmentioning
confidence: 99%