2014
DOI: 10.7567/jjap.53.080303
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Polarized photoluminescence imaging analysis around small-angle grain boundaries in multicrystalline silicon wafers for solar cells

Abstract: We have shown the effectiveness of polarized photoluminescence imaging for analyzing the structural and spectroscopic properties of small-angle grain boundaries (SA-GBs) in multicrystalline Si. The dislocation-related deep-level emission band at approximately 0.79 eV at room temperature was found to be polarized, whereas the band-edge emission did not show the polarization effect. The anisotropy of the 0.79 eV band was classified into two groups depending on the tilt and twist characteristics of SA-GBs determi… Show more

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Cited by 9 publications
(9 citation statements)
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“…This polarization effect is not observed at all grain boundaries, thus the geometrical effect identified by Peloso et al [14] is also not solely responsible for the effect. Our result is consistent with the recent observations of Kato et al [15] who report on the polarized nature of defect-band PL emission for both tilt and twist low angle GBs. However, our results further expand the understanding of these effects by showing that nearby high angle grain boundaries are not associated with any detectable polarized PL.…”
Section: Resultssupporting
confidence: 94%
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“…This polarization effect is not observed at all grain boundaries, thus the geometrical effect identified by Peloso et al [14] is also not solely responsible for the effect. Our result is consistent with the recent observations of Kato et al [15] who report on the polarized nature of defect-band PL emission for both tilt and twist low angle GBs. However, our results further expand the understanding of these effects by showing that nearby high angle grain boundaries are not associated with any detectable polarized PL.…”
Section: Resultssupporting
confidence: 94%
“…The regions emitting lower band-to-band PL in Figure 1d show higher defect-band PL in Figure 1e which is small compared to the maximum and minimum intensities from defect PL emission of about ±300 units. Compared to the conventional approach, where the analyzer has to be manually set to a desired angle [15], the imaging tool presented here takes advantage of the digitized controller and can complete a full-wafer measurement in less than a minute.…”
Section: Methodsmentioning
confidence: 99%
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“…Figure b shows a polar plot for the mc-Si wafer in which the D1/D2 and D3/D4 bands exhibit strong polarization behavior, with a 90° shift of intensity dependence. This is consistent with several previous works reported on the polarization of D-bands from mc-Si wafers, reflecting the anisotropic distribution of dislocations. However, the DRL peaks observed in the Cz-Si wafers in this work do not exhibit any polarization phenomena, as shown for the 7 h growth-step annealed sample in Figure b. This could be due to dislocations in the vicinity of the oxygen precipitates being isotopically oriented, rather than preferentially oriented as in mc-Si .…”
Section: Resultssupporting
confidence: 93%
“…Recently, as an alternative experimental method to CL measurements, a microscopic and spectroscopic mapping of dislocation related photoluminescence was proposed by the group of Tajima and co-workers 26 . The spatial resolution of the photoluminescence mapping is clearly lower than in CL images, but the photoluminescence investigations additionally allows the polarization of the deep level emission band correlated to dislocations to be determined in LAGBs with twist and tilt structures 27,28 .…”
Section: Discussionmentioning
confidence: 99%