Porosity engineering in glancing angle deposition thin films

Jensen, Martin O.; Brett, Michael

doi:10.1007/s00339-004-2878-5

Cited by 101 publications

(52 citation statements)

References 20 publications

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“…Other sample rotations and/or movements include the so-called PhiSweep, wherein the substrate is rotated back and forth around /, and left for controlled periods of time at each of these angular positions [93]. Meanwhile, with swing tilting rotation, the substrate is smoothly rotated back-and-forth along its azimuth within an angular range of D/, which is called the swing angle.…”

Section: Sculptured Thin Filmsmentioning

confidence: 99%

Perspectives on oblique angle deposition of thin films: From fundamentals to devices

Barranco

Borrás

González‐Elipe

et al. 2016

Progress in Materials Science

617

436

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a b s t r a c tThe oblique angle configuration has emerged as an invaluable tool for the deposition of nanostructured thin films. This review develops an up to date description of its principles, including the atomistic mechanisms governing film growth and nanostructuration possibilities, as well as a comprehensive description of the applications benefiting from its incorporation in actual devices. In contrast with other reviews on the subject, the electron beam assisted evaporation technique is analyzed along with other methods operating at oblique angles, including, among others, magnetron sputtering and pulsed laser or ion beam-assisted deposition techniques. To account for the existing differences between deposition in vacuum or in the presence of a plasma, mechanistic simulations are critically revised, discussing well-established paradigms such as the tangent or cosine rules, and proposing new models that explain the growth of tilted porous nanostructures. In the second part, we present an extensive description of applications wherein oblique-angle-deposited thin films are of relevance. From there, we proceed by considering the requirements of a large number of functional devices in which these films are currently being utilized (e.g., solar cells, Li batteries, electrochromic glasses, biomaterials, sensors, etc.), and subsequently describe how and why these nanostructured materials meet with these needs.

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Section: Sculptured Thin Filmsmentioning

confidence: 99%

Perspectives on oblique angle deposition of thin films: From fundamentals to devices

Barranco

Borrás

González‐Elipe

et al. 2016

Progress in Materials Science

617

436

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“…The fan-out phenomenon still exists at the very initial stages of growth and the diameter of the columns grows as a function of time, but the growth quickly stops after the initial transient. Another scheme to reduce the side-way growth is a "sweeping" technique [15] where the incident angle alternatively changes between position φ 1 and position φ 2 . It was shown that the size (diameter) of the columns grown on a flat surface can be maintained.…”

Section: Two-phase Rotation Schemementioning

confidence: 99%

Physical Self-Assembly And Nano-Patterning

Karabacak

et al. 2004

MRS Proc.

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It is known that oblique angle deposition (or glancing angle deposition) can create 3D architectures that are otherwise difficult to produce using the conventional lithographic techniques. The technique relies on a self-assembly mechanism originated from a physical shadowing effect during deposition. In this paper we show examples of 3D nanostructures obtained by this oblique angle deposition on a templated substrate with regularly spaced pillar seeds. We show that common to this technique is the phenomenon of side-way growth on the seeds. The side-way growth leads to a fan-like structure at the initial stages of growth if the incident oblique angle is fixed during growth. Simulations based on a steering effect due to the attractive force between the incoming atom and the existing atoms on the surface produce a fanlike structure similar to that observed experimentally. We show that a two-phase substrate rotation scheme during deposition can dramatically reduce this fan-out effect and can lead to uniform and isolated columns.

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“…voids between the columns [29,57]. Indeed the density of GLAD films is known to decrease with the increase of the substrate inclination angle, especially for angle higher than 60 [38,39,58,59].…”

Section: Residual Stresses Analysesmentioning

confidence: 99%

Critical angles in DC magnetron glad thin films

Siad

Besnard

Nouveau

et al. 2016

Vacuum

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a b s t r a c tThe objective of this study is to examine the sudden drop in properties of aluminum, titanium and chromium thin films prepared by the glancing angle deposition method. The thin films were deposited by DC magnetron sputtering under identical deposition conditions. A substrate-holder with seven different orientations with respect to the target normal was used. The thickness and the column tilt angles (b) of the thin films were determined by scanning electron microscopy. The residual stress of the thin films was evaluated using the wafer curvature technique and calculated by the Stoney's formula. The thickness variation and column tilt angle versus the orientation of the substrate indicated that the critical point is around 60 for all metallic materials and a critical angle of 60 is also found for the residual stress. Simulations of the particles transport are compared to the experimental data and moderate the critical angles analyses.

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Porosity engineering in glancing angle deposition thin films

Cited by 101 publications

References 20 publications

Perspectives on oblique angle deposition of thin films: From fundamentals to devices

Perspectives on oblique angle deposition of thin films: From fundamentals to devices

Physical Self-Assembly And Nano-Patterning

Critical angles in DC magnetron glad thin films

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