Position Control in Lithographic Equipment [Applications of Control]

Butler, Hans

doi:10.1109/mcs.2011.941882

Cited by 329 publications

(17 citation statements)

References 3 publications

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“…A similar feedback control experiment of the motor has demonstrated the superiority of PID control system. The feedforward forces are calculated by multiplying the set‐point reference acceleration by the stage's mass and inertia 81 …”

Section: Control Of Overlaymentioning

confidence: 99%

Mechanical system and dynamic control in photolithography for nanoscale fabrication: A critical review

Song

Chen

Huo³

et al. 2021

Int Journal of Mech Sys Dyn

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As one of the most advanced and precise equipment in the world, a photolithography scanner is able to fabricate nanometer-scale devices on a chip. To realize such a small dimension, the optical system is the fundamental, but the mechanical system often becomes the bottleneck. In the photolithography, the exposure is a dynamic process. The accuracy and precision of the movement are determined by the mechanical system, which is even more difficult to control compared with the optical system. In the mechanical system, there are four crucial components: the reticle and wafer stages, the linear motor, the metrology system, and the control system. They work together to secure the reticle and substrate locating at the correct position, which determines the overlay and alignment performance in the lithography. In this paper, the principles of these components are reviewed, and the development history of the mechanical system is introduced.

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Section: Control Of Overlaymentioning

confidence: 99%

Mechanical system and dynamic control in photolithography for nanoscale fabrication: A critical review

Song

Chen

Huo³

et al. 2021

Int Journal of Mech Sys Dyn

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show abstract

“…With a ¼ 1 the coarse actuator follows the fine actuator, which is the master-slave configuration. Such configuration is often seen in zero-stiffness DSA systems [10,11]. For the proposed low-stiffness DSA a is set at 0.5 for equal weight.…”

Section: Feedback Control Of Coarse Actuatormentioning

confidence: 99%

“…Particularly Lorentz actuators are commonly used due to their high linearity [7]. They are often combined with commutated motors [8][9][10] and applied to wafer scanners for lithography [11], as well as to robot arms for automatic assembly [12]. In these systems, the movable parts are suspended typically pneumatically or magnetically to ensure zero stiffness.…”

Section: Introductionmentioning

confidence: 99%

Low-stiffness dual stage actuator for long rage positioning with nanometer resolution

2015

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“…Thus, in 1960, the meter was redefined in terms of the orange line from a 86 Kr discharge lamp. Although bulky and costly, the interferometer has been the sensor of choice for applications such as IC wafer steppers 5,6 and metrological systems. 7 The operating principle of a Michelson interferometer is described in Figure 1.…”

Section: Introductionmentioning

confidence: 99%

A closed-loop phase-locked interferometer for wide bandwidth position sensing

Fleming

Routley

2015

Review of Scientific Instruments

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This article describes a position sensitive interferometer with closed-loop control of the reference mirror. A calibrated nanopositioner is used to lock the interferometer phase to the most sensitive point in the interferogram. In this configuration, large low-frequency movements of the sensor mirror can be detected from the control signal applied to the nanopositioner and high-frequency short-range signals can be measured directly from the photodiode. It is demonstrated that these two signals are complementary and can be summed to find the total displacement. The resulting interferometer has a number of desirable characteristics: it is optically simple, does not require polarization or modulation to detect the direction of motion, does not require fringe-counting or interpolation electronics, and has a bandwidth equal to that of the photodiode. Experimental results demonstrate the frequency response analysis of a high-speed positioning stage. The proposed instrument is ideal for measuring the frequency response of nanopositioners, electro-optical components, MEMs devices, ultrasonic devices, and sensors such as surface acoustic wave detectors.

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Position Control in Lithographic Equipment [Applications of Control]

Cited by 329 publications

References 3 publications

Mechanical system and dynamic control in photolithography for nanoscale fabrication: A critical review

Mechanical system and dynamic control in photolithography for nanoscale fabrication: A critical review

Low-stiffness dual stage actuator for long rage positioning with nanometer resolution

A closed-loop phase-locked interferometer for wide bandwidth position sensing

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