Positive Radiation Resists

Moreau, Wayne M.

doi:10.1007/978-1-4613-0885-0_3

Cited by 2 publications

(3 citation statements)

References 183 publications

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“…The big sensitivity difference between the two resists is expected because EPR is a chemically amplified resist. 9 This difference is also in good agreement with results at shorter wavelength x rays reported for related EPR 10 and PMMA 7,8 formulations and with unpublished results with ArF and F 2 lasers together with quadrapole mass spectrometry studies.…”

Section: ϫ2supporting

confidence: 91%

“…Up to now, the only known photoresist used successfully in SXCM has been polymethyl methacrylate ͑PMMA͒. [6][7][8] This is a high resolution photoresist when exposed to e-beam or x-ray radiation, with contrast suitable for grayscale recording; nevertheless, it is a relatively slow photoresist ͑Ralph Feder and co-workers at IBM also used a copolymer of PMMA with MMA with about a twofold increase in sensitivity 7 ͒ and, therefore, requires a very large fluence of x rays for imaging. This fact has limited the range of x-ray sources that can be used mainly to those of large national facilities.…”

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confidence: 99%

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Laser plasma x-ray contact microscopy of living specimens using a chemically amplified epoxy resist

Cefalas

Argitis

Kollia

et al. 1998

Applied Physics Letters

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We report on the use of an epoxy based chemically amplified resist, to produce x-ray images of living biological specimens, exposed with laser plasma generated soft x rays, in the water window ͑2.3-4.4 nm͒. The photoresist response was at least two orders of magnitude ''faster'' than polymethyl methacrylate, the standard resist used so far in soft x-ray contact microscopy. Atomic force and scanning electron microscopy of the biological specimen images, recorded in the resist, clearly showed the flagella of the motile green alga, chlamydomonas, suggesting a lateral resolution better than 150 nm. The resist was also capable of providing height features, as small as 20 nm, in atomic force microscope depth profiles and discriminating the flagella intersection areas.

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Section: ϫ2supporting

confidence: 91%

mentioning

confidence: 99%

Laser plasma x-ray contact microscopy of living specimens using a chemically amplified epoxy resist

Cefalas

Argitis

Kollia

et al. 1998

Applied Physics Letters

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“…The emergence of soft lithographic techniques that are not destructive to the supramolecular DNA organization will significantly broaden the range of their nanotechnological applications. Radiation lithography [92] is the most widespread and reliable patterning method.…”

Section: Peptidesmentioning

confidence: 99%

Gentle Patterning Approaches toward Compatibility with Bio‐Organic Materials and Their Environmental Aspects

Grebenko

Motovilov

Bubis

et al. 2022

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Advances in material science, bio-electronic, and implantable medicine combined with recent requests for eco-friendly materials and technologies inevitably formulate new challenges for nano-and micro-patterning techniques. Overall, the importance of creating micro and nanostructures is motivated by a large manifold of fundamental and applied properties accessible only at the nanoscale. Lithography is a crucial family of fabrication methods to create prototypes and produce devices on an industrial scale. The pure trend in the miniaturization of critical electronic semiconducting components is recently enhanced by implementing bio-organic systems in electronics. So far, significant efforts have been made to find novel lithographic approaches and develop old ones to reach compatibility with delicate bio-organic systems and minimize the impact on the environment. Herein, we briefly review such delicate materials and sophisticated patterning techniques.

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Positive Radiation Resists

Cited by 2 publications

References 183 publications

Laser plasma x-ray contact microscopy of living specimens using a chemically amplified epoxy resist

Laser plasma x-ray contact microscopy of living specimens using a chemically amplified epoxy resist

Gentle Patterning Approaches toward Compatibility with Bio‐Organic Materials and Their Environmental Aspects

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