Preparation and characterization of nanostructured titanium nitride thin films at room temperature

Solís-Pomar, Francisco; Nápoles, O.; Robaina, O. Vázquez; Gutiérrez-Lazos, C. D.; Fundora, A.; Colin, Angel; Pérez‐Tijerina, E.; Meléndrez, Manuel

doi:10.1016/j.ceramint.2016.01.164

Cited by 13 publications

(10 citation statements)

References 20 publications

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“…The lattice constants were found to be 4.18, 4.16, 4.16 and 4.17 Å for S1, S2, S3 and S4, respectively, indicating a little effect of annealing on the lattice constant of the films. These values are considerably close to the reported values of TiN lattice constant of 4.20 and 4.22 Å [30].…”

Section: Resultssupporting

confidence: 90%

“…Peak fitting of the N1s spectrum reveals that the spectrum can be deconvoluted into two peaks, one is due to Ti-N bond and the other relatively small peak can be attributed to titanium oxynitride Ti-O-N. High-resolution XPS spectra of N1s of all the samples are shown in Figure 5b. N1s peaks corresponding to Ti-N for as-grown and samples annealed at 300 and 500 • C are centered at 396.8 eV, 396.6 eV, and 397.4 eV, respectively [20,30,32]. The signal of N1s in the XPS spectrum of the sample annealed at 700 • C is too weak to determine the peak position indicating there is relatively less nitrogen in the sample.…”

Section: Samplementioning

confidence: 95%

“…This is consistent with the XRD data where the intensity of TiN (200) peak is much smaller compared to the TiN(200) peak intensity in the other samples. The second peak of nitrogen in the N1s spectra for the as-grown and for the samples annealed at 300 • C, is centered on 398.5 and 398.6 eV, which correspond to Ti-O-N formation [30,32]. Shown in Figure 5c is N1s spectra taken at different depths in the film by Ar ion etching.…”

Section: Samplementioning

confidence: 96%

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X-Ray Photoelectron Spectroscopy Depth Profiling of As-Grown and Annealed Titanium Nitride Thin Films

et al. 2021

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Titanium nitride thin films were grown on Si(001) and fused silica substrates by radio frequency reactive magnetron sputtering. Post-growth annealing of the films was performed at different temperatures from 300 °C to 700 °C in nitrogen ambient. Films annealed at temperatures above 300 °C exhibit higher surface roughness, smaller grain size and better crystallinity compared to the as-grown film. Bandgap of the films decreased with the increase in the annealing temperature. Hall effect measurements revealed that all the films exhibit n-type conductivity and had high carrier concentration, which also increased slightly with the increase in the annealing temperature. A detailed depth profile study of the chemical composition of the film was performed by x-ray photoelectron spectroscopy confirming the formation of Ti-N bond and revealing the presence of chemisorbed oxygen in the films. Annealing in nitrogen ambient results in increased nitrogen vacancies and non-stoichiometric TiN films.

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Section: Resultssupporting

confidence: 90%

Section: Samplementioning

confidence: 95%

Section: Samplementioning

confidence: 96%

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X-Ray Photoelectron Spectroscopy Depth Profiling of As-Grown and Annealed Titanium Nitride Thin Films

et al. 2021

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“…With the polished surface, the intrinsic water contact angles (WCAs) of TiB 2 , ZrB 2 , and HfB 2 are 89.0°, 84.8°, and 84.0°, respectively (Figure a–c). These WCAs are higher than those of untreated Mg alloy (44.6°), single crystal TiO 2 (72° and 74°), and TiN/Si (75°) and are comparable with that of a diamond (93°). − Thus, these borides are potential hydrophobic materials. The needle-like surface increases the WCAs of TiB 2 , ZrB 2 , and HfB 2 to 132.0°, 116.8°, and 114.0°, respectively (Figure d–f).…”

Section: Resultsmentioning

confidence: 88%

Robust Hydrophobic Materials by Surface Modification in Transition-Metal Diborides

Gan

Liu

Zhang

et al. 2021

ACS Appl. Mater. Interfaces

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Exploring the hydrophobicity of robust conductors is significant for electronic devices to simultaneously be used in a wet environment and extreme conditions. However, a combination of conductivity, strong mechanical properties, and hydrophobicity in one material is hindered by the inherent features of the materials. A new kind of robust hydrophobic conductor is designed in transition-metal diborides (TMdBs: TiB 2 , ZrB 2 , and HfB 2 ) to break through this challenge. The results calculated by density functional theory indicate that high hardness comes from high shear and bulk modulus, which is consistent with experimental results (TiB 2 , 25.0 GPa; ZrB 2 , 17.5 GPa; HfB 2 , 21.5 GPa). The theoretical calculated results reveal that edge sides have a lower surface energy than basal plane (001) in TMdBs. Hence, the edge sides are exposed with a needle-like morphology in TMdBs. Moreover, needle-like surfaces exhibiting hydrophobicity have water contact angles of 132.0°(TiB 2 ), 116.8°(ZrB 2 ), and 114.0°(HfB 2 ). The hydrophobicity arises from a lower surface free energy of edge sides in TMdBs and a rough surface that reduces the contact area of water and a solid. This work develops a new kind of robust functional material in TMdBs.

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“…Nowadays, nano-layer hard coatings are very important in the manufacture of mechanical tools. This is because of high demand and its impact on the industrial part is those for surface hardening of conventional materials, which can be used efficiently to extend the lifetime of these tools (Solis-Pomar et al, 2016). Particularly, nitride coatings are commonly used as hard, wear-resistant, and anti-corrosion coatings because of their excellent properties (Santecchia et al, 2015).…”

Section: Introductionmentioning

confidence: 99%

Structural and Oxidation Behavior of Nanocomposite TiCrN Thin Films

Alaksanasuwan

Buranawong

Witit-Anun

2022

Suan Sunandha Sci & Tech

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The structural and oxidation behavior of nanocomposite titanium chromium nitride (TiCrN) thin films has been investigated by using x-ray diffraction (XRD), energy dispersive x-ray spectroscopy (EDS), and field emission scanning electron microscopy (FE-SEM). The TiCrN thin films were deposited on Si substrates by using the reactive DC magnetron sputtering technique from the Ti-Cr mosaic target. After that, the as-deposited thin films were annealed in the air at 500 - 900°C for 2 h. The XRD results showed that the formation oxidation of anataseTiO2, rutile-TiO2, and Cr2O3 which diffraction peak appear from 500°C. The relative intensity of these oxide peaks varied with the annealed temperatures. By observing from FE-SEM, the aggregation of the grain increased with the annealing temperature. The cross-sectional results showed that the thin dense oxide overlayer occurred at 700°C and the oxide thickness increased gradually with the annealing temperature. Meanwhile, underneath the TiCrN grain grew above 700°C and become more void structure after annealing at 700°C. The dramatically increase of the oxygen content was found at 700°C and the evolution of Ti, Cr, N, and O with different elements compositions at various annealing temperatures were investigated from the EDS technique. The oxide layer obviously grows inward indicating the oxidation of TiCrN thin films belongs to inward oxidation. The oxidation rate of the films was increased with the increase of annealing temperature. The activation energy of the oxidation as evaluated by the Arrhenius-type relation was 168 kJ/mol.

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Preparation and characterization of nanostructured titanium nitride thin films at room temperature

Cited by 13 publications

References 20 publications

X-Ray Photoelectron Spectroscopy Depth Profiling of As-Grown and Annealed Titanium Nitride Thin Films

X-Ray Photoelectron Spectroscopy Depth Profiling of As-Grown and Annealed Titanium Nitride Thin Films

Robust Hydrophobic Materials by Surface Modification in Transition-Metal Diborides

Structural and Oxidation Behavior of Nanocomposite TiCrN Thin Films

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