Electrodeposition of functional coatings on aluminum electrodes in aqueous solutions often is impeded by the corrosion of aluminum. In the present work it is demonstrated that electrodeposition of vanadium oxide films on nanostructured aluminum substrates can be achieved in acidic electrolytes employing a novel strategy in which a thin interspacing layer of manganese oxide is first electrodeposited on aluminum microrod substrates. Such deposited films, which were studied using SEM, XPS, XRD, and surface enhances Raman scattering as well as chronopotentiometry, are shown to comprise a mixture of vanadium oxidation states (i.e. IV and V). As this all-electrochemical approach circumvents the problems associated with aluminum corrosion, the approach provides new possibilities for the electrochemical coating of nanostructured Al substrates with functional layers of metal oxides. The latter significantly facilitates the development of new procedures for the manufacturing of three-dimensional aluminum based electrodes for lithium ion microbatteries. The continuous miniaturization within the field of electronics has created increased interest in the modification of nanostructured substrates and electrodeposition has emerged as a particularly promising technique for straightforward and cost-effective preparation of threedimensional (3D) structures, allowing the realization of nanostructures with functional layers.1,2 The fact that the fabrication and coating of complex 3D nanostructures can be carried out at low temperatures with precise control differentiates electrochemical deposition from other thin film deposition techniques including physical vapor deposition (PVD), chemical vapor deposition (CVD) and atomic layer deposition (ALD).1 Template-assisted electrodeposition has been demonstrated to be a particularly versatile technique in the manufacture of nanostructured substrates, such as 3D arrays of copper 3,4 and aluminum nanorods. 5,6 Whereas the deposition of copper nanostructures is relatively straightforward, the corresponding deposition of aluminum nanostructures is more demanding 1 due to the need for non-aqueous solutions and a controlled oxygen-free atmosphere. Electrochemical deposition of layers of functional material on aluminum from aqueous solutions is further complicated by the fact that the aluminum surface is coated by a passivating Al 2 O 3 film between pH 5 and 8, while there is aluminum corrosion in acidic as well as alkaline solutions.
7Aluminum has a wide field of application mainly due to its low cost, low weight and high thermal and electronic conductivities.8 Much work has therefore been carried out to develop techniques for the protection of Al surfaces from corrosion, e.g. based on electrodeposition of protecting polymer layers on planar aluminum substrates. [8][9][10] In addition, a significant interest in investigating the possibilities for electrodeposition of electroactive layers on aluminum nanostructures has recently arisen as a result of the success in the manufacturing of electrodep...