Preparation of Barium Titanate Film by Metal-Organic Chemical Vapor Deposition and its Thermodynamic Analysis

Growth and evaluation of epitaxial BaTiO3thin films of less than 100 nm thickness by metal–organic chemical vapor deposition

“…Ba(DPM) 2 -2tetraene is a next-generation liquid precursor that has been developed from Ba(DPM) 2 that has generally been used for the growth of BTO thin films by MOCVD. 16,18,[21][22][23] It has a higher vapor pressure and a higher stability than Ba(DPM) 2 . 26) Pt(001)/MgO(001) was used as the substrate.…”

“…The BTO thin films must have high crystallinity and excellent electrical properties. Therefore, various growth methods of films, such as sol-gel, [3][4][5] sputtering, 6,7) chemical solution deposition (CSD), [8][9][10] molecular beam epitaxy (MBE), 11) pulse laser deposition (PLD), [12][13][14] and metal-organic chemical vapor deposition (MOCVD) [15][16][17][18][19][20][21][22][23][24] methods, have been applied to BTO thinfilm growth. Among these methods, we have focused on MOCVD as it has some advantages, such as easy control of the composition, a simple system with no high vacuum, and easy deposition of highly crystalline films.…”

Microstructure and Dielectric Properties of Barium Titanate Film Prepared by MOCVD

“…The detailed experimental setup was reported elesewhere. 16) Bis-dipivaloylmethanato-barium (Ba(DPM) 2 ) and bis-isopropoxy-bis-dipivaloylmethanato-titanium (Ti(O- * Graduate Student, Tohoku University. i-C 3 H 7 ) 2 (DPM) 2 ) as Ba and Ti sources were vaporized at 503 to 523 K and 333 to 373 K, respectively.…”

“…Detailed procedure of the calculation was reported elsewhere. 16) 17 solid species (BaTiO 3 , Ba 2 TiO 4 , BaCO 3 , etc.) and 20 gas species (O 2 , CO 2 , H 2 O, etc.)…”