Preparation of rutile TiO2 thin films by laser chemical vapor deposition method

Abstract

TiO 2 thin films were prepared on Pt/Ti/SiO 2 /Si substrate by laser chemical vapor deposition (LCVD) method. The effects of laser power (P L ) and total pressure (p tot ) on the microstructure of TiO 2 thin films were investigated. The deposition temperature (T dep ) was mainly affected by P L , increasing with P L increasing. The single-phase rutile TiO 2 thin films with different morphologies were obtained. The morphologies of TiO 2 thin films were classified into three typical types, including the powdery, Wulff-shaped and granular microstructures. p tot and T dep were the two critical factors that could be effectively used for controlling the morphology of the films.

Structural, Morphological, and Electrochemical Corrosion Properties of TiO2 Formed on Ti6Al4V Alloys by Anodization

“…TiO 2 has been extensively investigated in recent years for its many potential applications such as photocatalyst, in solar cells, and in gas sensor . Several approaches have been developed for the synthesis TiO 2 nanotubes such as sol‐gel methods, chemical vapor deposition, hydrothermal, and physical vapor deposition …”

“…[7] TiO 2 has been extensively investigated in recent years for its many potential applications such as photocatalyst, [8] in solar cells, [9] and in gas sensor. [10] Several approaches have been developed for the synthesis TiO 2 nanotubes such as sol-gel methods, [11] chemical vapor deposition, [12] hydrothermal, [13] and physical vapor deposition. [14] The adopted approach to improve the osteointegration was to modify the metal surfaces by means of different techniques inducing more efficiency in the implant/bone interface, such as a chemical functionalization [15,16] and anodizing.…”

Femtosecond pulsed laser induced growth of highly transparent indium-tin-oxide thin films: Effect of deposition temperature and oxygen partial pressure

“…Several fabrication techniques have been developed for growth of ITO thin films, such as chemical vapor deposition (CVD) [18], magnetron sputtering [19], thermal evaporation [20], vacuum evaporation [21], electron-beam evaporation [22], spray pyrolysis [23], ion-beam sputtering [24], and pulsed laser deposition (PLD) [25].…”

Emission Properties Related to Distinct Phases of Sol-Gel Dip-Coating Titanium Dioxide, and Carrier Photo-Excitation in Different Energy Ranges

“…In general, this latter method involves the formation of sol or gel or precipitates by hydrolysis and condensation of titanium alkoxides 4 . TiO 2 thin films also are frequently obtained by chemical vapor deposition (CVD) 16 and spray pyrolysis deposition (SPD) 17 . More recently, TiO 2 have been produced in the form of nanotubes 18 , and there have been reports on the growth of nanotube films ordered by anodization 19 , because with this highly ordered arrangement the electron mobility can be improved 20 .…”