Preparation of selectivity controlled a-axis oriented YBCO films by laser MOCVD

Abstract

We have found a very effective way to control the orientation of YBCO films by MOCVD using ArF excimer laser ( A = 193 nm) irradiation on an MgO(100) substrate. It also enables u s to control crystalline orientation locally by focusing the laser. We found that the irradiated parts were stronglya-axis oriented normal to the surface of MgO(100) substrate for YBCO films prepared at 65&700"C, whereas the x-ray diffraction pattern of the unirradiated part consists of the peaks of (llO)y (001) and (h00) planes. The surface morphology of the laser-irradiated part of the films was very smooth, whereas that of t h e unirradiated part was comparatively rough. The zero-resistance temperatures of unirradiated and irradiated parts of YBCO prepared at 650°C were 45 K and 72 K respectively

Preparation of<tex>$rm YBa_2rm Cu_3rm O_rm x$</tex>Film Deposited on Various Substrates by MOCVD Processing

“…1, the a-axis growth is dominant at low temperature of 700 , the a-axis and c-axis growth occurs together in the intermediate temperatures of 720 -740 , but the c-axis growth is dominant above 760 . The temperature dependence of the growth orientation of YBCO film is similar to the results previously reported by others [13], [14].…”

High-Temperature Superconducting Materials with High Current-Carrying Characteristics and Methods of Their Fabrication

“…Реакторы разделяются по своей геометрии (вертикальной или горизонтальной), температуре стенок реактора (реакторы с горя-чими или холодными стенками); по применению различных ме-тодов дополнительной активации процесса напыления, основны-ми методами такой активации являются плазменная и лазерная [97,98]. Рис.…”

An analysis of electron beam evaporation of SrTiO3on Si substrates

“…The system YBa$3zO7 (YBCO) has been studied extensively both in bulk and film form (thin and thick). The films have been formed on a variety of substrates such as crystalline SrTiO3 [2], MgO [31,LA103 [4], LaGaO3 [51, YSZ 161 and bare and buffered Si [7,8]. Deposition of an SrTiO3 thin film has been attempted recently by using magnetron sputtering 191 and pulsed laser deposition [IO].…”