Preparation of sol–gel ZrO2–SiO2 highly reflective multilayer films and laser-induced damage threshold characteristic

Determination of Optical Properties of Thin Films from Ketteler-Helmholtz Dispersion Relations: Application to the Case of Ultraviolet Irradiated Zirconium Oxide

“…It is an electrical insulating material with a band gap of 5 eV and has potential use as an alternative material for storage capacitors in dynamic random access memories. In addition to its interesting electrical properties, ZrO 2 thin film also has highly attractive optical properties such as low absorption of light, high index of refraction, high transparency over a wide spectral range, and high field damage threshold and is therefore very attractive for laser optic applications [16][17][18][19][20][21][22][23]. The properties of the film, however, highly depend on the deposition method chosen as well as the deposition conditions (substrate nature and temperature, partial gas pressure, and deposition rate).…”

3D Micro-Optics Via Ultrafast Laser Writing: Miniaturization, Integration, and Multifunctionalities

“…Damage threshold of the pure SZ2080 at mostly used testing conditions (1064 nm wavelength, one-on-one regime, nanosecond pulse mode) is equal to ∼20 J cm -2 , whereas the LIDT of AR coatings at the same experimental conditions ranges from 10 J cm -2 to 80 J cm -2 [70][71][72][73][74][75][76]. Damage threshold of the pure SZ2080 at mostly used testing conditions (1064 nm wavelength, one-on-one regime, nanosecond pulse mode) is equal to ∼20 J cm -2 , whereas the LIDT of AR coatings at the same experimental conditions ranges from 10 J cm -2 to 80 J cm -2 [70][71][72][73][74][75][76].…”

Plasma-Enhanced Atomic Layer Deposition of HfO2 with Substrate Biasing: Thin Films for High-Reflective Mirrors

“…Conventionally, high-reflective (HR) coatings are mainly prepared using PVD techniques. 54−59 Several dielectric material combinations have been used for HR coatings such as TiO 2 /SiO 2 , 60,61 ZrO 2 /SiO 2 , 60,62,63 Nb 2 O 5 /SiO 2 , 60 Al 2 O 3 / SiO 2 , 64,65 Ta 2 O 3 /SiO 2 , 60,66,67 Ta 2 O 3 /Al 2 O 3 , 58 HfO 2 / SiO 2 , 54,59,68,69 and HfO 2 /Al 2 O 3 . 58 The 2020 SPIE laser damage symposium evaluated the laser-induced damage threshold (LIDT) of mirrors (deposited with five different PVD methods) at 532 nm wavelength with nanosecond pulses.…”

“…Also, absorption losses in these coatings can increase with nonstoichiometric defects such as oxygen vacancies or electronic defects. , Hence, high-power laser applications require coatings with low absorption and minimal nodular defects. Conventionally, high-reflective (HR) coatings are mainly prepared using PVD techniques. − Several dielectric material combinations have been used for HR coatings such as TiO 2 /SiO 2 , , ZrO 2 /SiO 2 , ,, Nb 2 O 5 /SiO 2 , Al 2 O 3 /SiO 2 , , Ta 2 O 3 /SiO 2 , ,, Ta 2 O 3 /Al 2 O 3 , HfO 2 /SiO 2 , ,,, and HfO 2 /Al 2 O 3 . The 2020 SPIE laser damage symposium evaluated the laser-induced damage threshold (LIDT) of mirrors (deposited with five different PVD methods) at 532 nm wavelength with nanosecond pulses.…”