Preparing a New Class of Ultrathin Graphene Nanostructure by Chemical Vapor Deposition and Its Lasing Ability

Abstract

In this paper, we report a new method to grow graphene monolayers directly on a quartz substrate using chemical vapor deposition (CVD), without using any catalyst. For this purpose, ethanol as the precursor and a quartz substrate were used for growth, which controlled the growth process and the formation of an ultrathin layer of graphene. In this project, with use of plasmaenhanced chemical vapor deposition (PECVD), the substrate was cleaned by applying the cold plasma with the aim of improving the quality of the graphene monolayer grown. Atomic force microscopy (AFM) and Raman spectroscopy confirm that the graphene layer in regular triangular pieces grew to 200 nm in size. Photoluminescence spectroscopy (PL) of the samples showed a sharp peak in the blue spectrum, which indicates lasing emission in the graphene nanostructure. Finally, at a lower cost than other CVD methods, we have formed an ultrathin graphene layer on a dielectric substrate that can have many applications in the laser and photonics fields.