1994
DOI: 10.1063/1.1144897
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Production of electron cyclotron resonance plasma for uniform deposition using a TE01 mode microwave

Abstract: Articles you may be interested inElectron cyclotron resonance plasma production by using pulse mode microwaves and dependences of ion beam current and plasma parameters on the pulse conditiona) Rev. Sci. Instrum. 83, 02A324 (2012); 10.1063/1.3669792Production of highly uniform electron cyclotron resonance plasmas by distribution control of the microwave electric field Hard boron oxide thinfilm deposition using electron cyclotron resonance microwave plasmas

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