“…Different a-SiOx:H materials have been prepared by various different methods by different research groups, of which plasma enhanced chemical vapor deposition (PECVD) [5,6] is a popular one. Different oxygen source gases have also been used in preparing aSiOx:H material, such as H 2 O [7,8], CO 2 [5,9,10], oxygen [11,12], or pure N 2 O [13,14].…”