2006
DOI: 10.1016/j.jmmm.2006.02.008
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Property changes of electroplated Cu/Co alloys and multilayers by organic additives

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Cited by 10 publications
(4 citation statements)
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“…Moreover, absorption of ν( 2 4 H PO  ) newly appeared at 1040 cm -1 [24]. The Co-site seems to be more sensitive to hydrogen-phosphate ion than that of Fe in the Co-Fe alloy, and the sensitivity to was thus decreased at the highest Fe content in alloy, as shown in Table 1.…”
Section: Sensing Performance Of the Metal Film Electrodementioning
confidence: 88%
See 1 more Smart Citation
“…Moreover, absorption of ν( 2 4 H PO  ) newly appeared at 1040 cm -1 [24]. The Co-site seems to be more sensitive to hydrogen-phosphate ion than that of Fe in the Co-Fe alloy, and the sensitivity to was thus decreased at the highest Fe content in alloy, as shown in Table 1.…”
Section: Sensing Performance Of the Metal Film Electrodementioning
confidence: 88%
“…FT-IR spectra of the Co 58 Fe 42 thin-film electrode before and after 2 4 H PO  measurements are shown in tively, appeared before the measurement [23,24]. Absorptions at around 1030, 1100 and 1600 cm -1 should be indicated for ν(…”
Section: Sensing Performance Of the Metal Film Electrodementioning
confidence: 96%
“…Unlike the presented study, it was reported in the study by Rӓtzke et al [12] that the annealing process up to 350 °C caused an increase in the H c value of the sputtered Co/Cu film. In addition, high temperature thermal annealing increased the coercivity values due to the growth of Co grains in the study [14]. M r /M s values were also determined in this context.…”
Section: The Effect Of Different Annealing Temperaturesmentioning
confidence: 67%
“…In another study done by Albini et al [13], the effect of annealing on the magnetic properties of Co/Cu multilayered structures produced by the sputtering technique was investigated and it was revealed that the annealing process improves the quality of the multilayer structures. The effects of organic additives and high temperature annealing on magnetic properties of Cu/Co alloys and multilayer structures produced by electroplating technique were investigated in a study by Hong et al [14]. In addition to these studies, in a study of Małkiński et al [15], the magnetic and magnetoresistance properties of sputtered Co/Cu multilayer structures as deposited and after annealing were discussed and it was understood that the annealing process had important effects on these properties of multilayer structures, such as a change in the shape of the hysteresis loop and a remarkable increase in the intensity of the magneto resistance hysteresis peaks.…”
Section: Introductionmentioning
confidence: 99%