2014
DOI: 10.1134/s1063782614050121
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Prospects for the development of high-power field-effect transistors based on heterostructures with donor-acceptor doping

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Cited by 25 publications
(3 citation statements)
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“…1) The p-HEMT structures exhibit high power gain, excellent cut-off frequency, low noise, and extremely good dc characteristics suitable for power microwave and high-speed device applications. [2][3][4][5][6][7][8][9] The performance of a device depends on the improvement of sheet electron density and mobility. Much effort has been made to study the enhancement of the electron mobility in the InGaAs-based pseudomorphic channels by employing different structure geometry and doping profiles.…”
Section: Introductionmentioning
confidence: 99%
“…1) The p-HEMT structures exhibit high power gain, excellent cut-off frequency, low noise, and extremely good dc characteristics suitable for power microwave and high-speed device applications. [2][3][4][5][6][7][8][9] The performance of a device depends on the improvement of sheet electron density and mobility. Much effort has been made to study the enhancement of the electron mobility in the InGaAs-based pseudomorphic channels by employing different structure geometry and doping profiles.…”
Section: Introductionmentioning
confidence: 99%
“…To date, there have been several approaches to decreasing the size of these elements. One approach is the growth of thin film devices (Volovich, 2006; Kerentsev and Lanin, 2008; Ageev et al , 2009; Volokobinskaya et al , 2001; Yu et al , 2014; Cho et al , 2014) another is the diffusion or ion doping of homogenous samples, or heterostructures, and still another is the laser or ion doping of the dopant and/or radiation defects (Ong et al , 2006; Wang et al , 2006; Bykov et al , 2003; Svintsov et al , 2013; Alexandrov et al , 2013; Lukashin et al , 2014). The inhomogeneous distribution of temperature can be obtained in the doped inhomogeneity of the structure while will then lead to a decreasing number of dimensions within the considered devices.…”
Section: Introductionmentioning
confidence: 99%
“…In this case the height of the barriers is approximately comparable with the band-gap value in the AlGaAs of about 1.5 eV, whereas the height of the barriers without such a doping is limited by the band-gap off-set at the AlGaAs/InGaAs heterointerface of 0.3 eV. A new type of AlGaAs/InGaAs heterostructures with donor-acceptor doped barriers (DA-pHEMT) allows us to suppress the parasitic parallel conductivity via the δ-n-layers placed in the barriers and enhance the output power density of the DA-pHEMT transistor [3]. However, the electron mobility in DA-pHEMT heterostructures is lowered by scattering on ionized donors from the broadened δ-sublayers located in the barriers [4].…”
Section: Introductionmentioning
confidence: 99%