1996
DOI: 10.1016/s0169-4332(96)00443-6
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Pulsed-laser deposition and boron-blending of diamond-like carbon (DLC) thin films

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Cited by 34 publications
(10 citation statements)
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“…Owing to these properties, DLCs are extensively used in diverse fields such as wear coatings, microelectronics, microtribology and biomedical technology. However their insulating properties and wide band gap lead to limitation of their applications in electronics (unless the charge carriers are incorporated into them [21][22][23][24][25]). Compounds with various boron to carbon stoichiometries and a the ratio higher than 2 are known as boron carbides.…”
Section: Introductionmentioning
confidence: 99%
“…Owing to these properties, DLCs are extensively used in diverse fields such as wear coatings, microelectronics, microtribology and biomedical technology. However their insulating properties and wide band gap lead to limitation of their applications in electronics (unless the charge carriers are incorporated into them [21][22][23][24][25]). Compounds with various boron to carbon stoichiometries and a the ratio higher than 2 are known as boron carbides.…”
Section: Introductionmentioning
confidence: 99%
“…DLC thin films with non-metal elements like N, B, Si, F incorporated have been developed using various deposition techniques, including pulsed laser deposition (Kautek et al, 1996), filtered cathodic arc deposition (Monteiro, 2001), biased target ion beam deposition (Sethuraman, 2009), direct current magnetron sputtering (Kahn et al, 2007), radio frequency plasma enhanced CVD (Hasebe et al, 2007) and plasma immersion ion implantation and deposition (Yao et al, 2004). The non-metal element doping into DLC provides improved film mechanical, tribological, thermal, electronic and biological properties.…”
Section: Non-metal Doped Dlcmentioning
confidence: 99%
“…These include MSIBD via alternating direct deposition of low energy mass-separated C ions and B ions (Ronning et al, 1995), pulsed laser deposition using a XeCl excimer laser of 308 nm wavelength and polycrystalline graphite and boron carbide targets (Kautek et al, 1996), filtered cathodic arc deposition with a mixed plasma stream from a B 4 C cathode and a graphite cathode as sources (Monteiro, 2001), non-balanced reactive magnetron direct current sputtering using B 4 C target as B source (Ahmad et al, 2007), radio frequency plasma enhanced CVD with CH 4…”
Section: Boron Doped Dlcmentioning
confidence: 99%
“…Various PVD and CVD techniques like biased target ion beam deposition [50], pulsed laser deposition [51], direct current magnetron sputtering [52], filtered cathodic arc deposition [29], plasma immersion ion implantation and deposition [53], and radio frequency plasma enhanced CVD [54] have been used to deposit DLC thin films with non-metal elements such as N, B, Si, F.…”
Section: Non-metal Doped Dlcmentioning
confidence: 99%