2009
DOI: 10.1063/1.3121509
|View full text |Cite
|
Sign up to set email alerts
|

Purely hopping conduction in c-axis oriented LiNbO3 thin films

Abstract: Dielectric constant and ac conductivity of highly c-axis oriented LiNbO3 thin film grown by pulsed laser deposition were studied in a metal-insulator-metal configuration over a wide temperature (200 to 450 K) and frequency (100 Hz to 1 MHz) range. The preferred oriented Al (1%) doped ZnO film with electrical conductivity 1.1×103 Ω−1 cm−1 was deposited for dual purpose: (1) to serve as nucleating center for LiNbO3 crystallites along preferred c-axis growth direction, and (2) to act as a suitable bottom electrod… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1

Citation Types

0
10
0

Year Published

2009
2009
2017
2017

Publication Types

Select...
9

Relationship

1
8

Authors

Journals

citations
Cited by 30 publications
(11 citation statements)
references
References 24 publications
0
10
0
Order By: Relevance
“…The values of n for SBTMCO at different temperatures are determined to be 0.56-0.69, which are similar to those observed in many other oxide materials. 45,46 The inset of Fig. 9 shows the plot of ln(r dc ) vs. 1000/T.…”
Section: Resultsmentioning
confidence: 98%
“…The values of n for SBTMCO at different temperatures are determined to be 0.56-0.69, which are similar to those observed in many other oxide materials. 45,46 The inset of Fig. 9 shows the plot of ln(r dc ) vs. 1000/T.…”
Section: Resultsmentioning
confidence: 98%
“…7͒. If C p and R p represent the equivalent parallel capacitance and resistance, and C e , R e and C b , R b are assumed to be independent of frequency, then C p and R p are given by 12,13 …”
Section: Resultsmentioning
confidence: 99%
“…18 This was much different from the electrical transporting in single LNO film. 9 Besides, a slight difference of the slopes could be caused by the interface-state traps. Figure 3͑a͒ shows the retention characteristics of the heterostructure at room temperature ͑RT͒ and 300°C using Ϫ30 and 10 V gate voltage stress for 10 s, respectively.…”
mentioning
confidence: 99%