2008
DOI: 10.1109/tns.2008.2007119
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Quantifying the Effect of Guard Rings and Guard Drains in Mitigating Charge Collection and Charge Spread

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Cited by 57 publications
(22 citation statements)
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“…For the NMOS-inside layout structure in Fig. 1(c), the reason of the high number of MBU is that the bipolar amplification effect is more evident in PMOS transistors in typical twin-well process [11,12]. This layout structure is mainly applied to the deep N-well process.…”
Section: Simulation Results and Discussionmentioning
confidence: 99%
See 1 more Smart Citation
“…For the NMOS-inside layout structure in Fig. 1(c), the reason of the high number of MBU is that the bipolar amplification effect is more evident in PMOS transistors in typical twin-well process [11,12]. This layout structure is mainly applied to the deep N-well process.…”
Section: Simulation Results and Discussionmentioning
confidence: 99%
“…But this technique is applied to the deep N-well process. For the typical twin-well process, the bipolar amplification effect is more pronounced in PMOS transistors [11,12]. This will increase the charge collected by the adjacent PMOS transistors in the two adjacent SRAM cells.…”
Section: Related Workmentioning
confidence: 99%
“…At layout-level, guard rings and guard bands are usually used to sink excess charge away to reduce the produced SET pulse width [2,3]. A layout hardening technique presented by Atkinson et al [4] exploits the pulse quenching effect to limit the pulse origination.…”
Section: Introductionmentioning
confidence: 99%
“…In common CMOS process, the radiation hardened by design (RHBD) layout methods have been proposed to enhance the SET tolerance [1,2,3,4,5,6,7]. Charge sharing techniques and SETs model are used to mitigate SET effects [8,9].…”
Section: Introductionmentioning
confidence: 99%