Quantitative characterizations of a nanopatterned bonded wafer: force determination for nanoimprint lithography stamp removal

Landis, S.; Chaix, N.; Gourgon, C.; Leveder, T.

doi:10.1088/0957-4484/19/12/125305

Cited by 31 publications

(17 citation statements)

References 43 publications

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“…The thickness of coated polystyrene films ranges from h 0 = 27 nm up to 237 nm and is measured by ellipsometry ͑27, 34, 43, 81, 118, 180, and 237 nm͒. Polystyrene films are subsequently patterned with the NIL technique 8,9 ͑Fig. 1͒.…”

Section: Methodsmentioning

confidence: 99%

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Thin polymer films viscosity measurements from nanopatterning method

Leveder

Landis

Chaix

et al. 2010

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

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Polystyrene films, with thickness ranging from a few tens of nanometers up to several hundreds of nanometers and molecular weight of 27.5 kg mol−1, were patterned with nanoimprint lithography (NIL) technique. A rigid silicon stamp containing nanoscale features was printed into a thin spin coated polystyrene film. Then these patterns were annealed above the glass transition temperature in order to characterize the viscous reflow of the topography. Special attention was paid to provide, at initial times, imprinted nanoscale patterns with a very small aspect ratio and amplitude/wavelength as well as to avoid the nucleation of holes during imprinting or during the course of the reflow. This allowed the authors to process topography data with a high degree of accuracy from a linear viscous stability model. Atomic force microscopy measurements, with a spatial resolution lower than 1 nm, were used to characterize smooth or steep shapes. The mechanical measurements of earlier stages of pattern reflow were directly accessible without any assumption, contrary to the diffraction method usually employed. Our results clearly demonstrate that even the earliest stages of pattern reflow are driven by simple viscous effects and that relaxation dynamics, which is usually considered as following exponential laws, could be more complex. This article also demonstrates that the NIL process can be used for viscosity measurements for ultrathin resist film.

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Section: Methodsmentioning

confidence: 99%

“…Figure 2͑a͒ shows the surface profile reflow at a glass temperature T g + 15°C of a 250 nm isodense imprinted line array and confirms that surface effects tend to smoothen the film. 1, 9,15 Regarding the shape evolution in Fig. 2͑a͒, the following decay function built from harmonic modes:…”

Section: Theoretical Analysismentioning

confidence: 99%

Thin polymer films viscosity measurements from nanopatterning method

Leveder

Landis

Chaix

et al. 2010

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

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“…This method is widely applied to determine the energy needed to achieve separation. Several reports addressed the surface energy between resist and template quantitatively [18][19][20][21]. We also reported evaluation results for various template surface states and release speeds [4,21].…”

Section: Evaluation Of Template Release Characteristicsmentioning

confidence: 99%

Evaluation of Template Release Energy with Use of Fluorinated Segregation Agents for UV Nanoimprint Resists

Nakamura

Yamashita

Kitagawa

et al. 2014

J. Photopol. Sci. Technol.

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Quantitative evaluation of template release energy is reported for UV nanoimprint resists containing various kinds of fluorinated segregation agents. The template release energy is evaluated based on fracture mechanics for various types of UV curable resists in which a fluorinated segregation agent is dissolved. The template release energy is effectively reduced. The higher molecular weight agent containing a hydrophilic group effectively reduces the energy by 5/6 ths . The defect ratio in nanoimprint lithography is also examined. The result shows that the defect ratio is effectively reduced by the use of fluorinated segregation agents.

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“…Behind this elementary process, a collection of progresses and developments has been acquired over the last 20 years, like complex and large scale stamp manufacturing processes [2], anti-sticking layer optimization [3] and characterization [4], dedicated imprint materials, dedicated metrology approaches [5] and commercial imprint equipment allowing high resolution and large scale patterning solutions. Thanks to that, tremendous improvements were achieved for process know-how and optimization, making feasible the assessment of NanoImprint Lithography (NIL) technology for a wide range of applications [6][7][8][9].…”

Section: Introductionmentioning

confidence: 99%

Influence of thermal diffusion and shear thinning during the leveling of nanoimprinted patterns in a polystyrene thin film

et al. 2015

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Science Arts & Métiers (SAM)is an open access repository that collects the work of Arts et Métiers ParisTech researchers and makes it freely available over the web where possible. Abstract. When capillary forces prevail, the leveling of the free surface of a fluid film is a natural phenomenon that has already found applicative interest either with brushmarks for paint coatings or for rheology on polymeric thin films. Among many parameters, the material behavior influences notably this phenomenon and its characterization still arouses curiosity at the nanoscale. In this article the nanoscale properties of a polystyrene film are derived from the leveling rate of nanoimprinted patterns and are compared to bulk values obtained with a parallel plate rheometer. In particular the focus is made on the isothermal assumption during the process and the consequences of an anisothermal state on the material behavior. Both points are investigated by using numerical simulations based on the natural element method. First we demonstrate experimentally that the leveling rate is influenced by the heat exchange at the air-polymer interface and that thermal diffusion should be taken into account within the film and its underlying substrate. Then we numerically investigate the influence of thermal diffusion and shear-thinning on the leveling rate. Finally we show that the bulk properties can represent particularly closely the behavior of the polymer at the nanoscale if adequate thermal boundary conditions are used and if shear-thinning is taken into account. This agreement postulates a decrease by 7• C of the mean temperature of the polystyrene film coated on silicon when experiments are carried out on a hotplate at 100• C in a cleanroom environment.

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Quantitative characterizations of a nanopatterned bonded wafer: force determination for nanoimprint lithography stamp removal

Cited by 31 publications

References 43 publications

Thin polymer films viscosity measurements from nanopatterning method

Thin polymer films viscosity measurements from nanopatterning method

Evaluation of Template Release Energy with Use of Fluorinated Segregation Agents for UV Nanoimprint Resists

Influence of thermal diffusion and shear thinning during the leveling of nanoimprinted patterns in a polystyrene thin film

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