2017
DOI: 10.1007/s11664-017-5561-2
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Quantum Size Effects in Transport Properties of Bi2Te3 Topological Insulator Thin Films

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Cited by 8 publications
(3 citation statements)
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“…Specifically, with Bi 2 Te 3 thin film fabricated on glass substrates using thermal evaporation, the oscillation of the Seebeck coefficient depends on thickness below 100 nm. It becomes stable similar to bulk material value above 100 nm [10][11][12]. This result is also reproduced on BiSe thin films fabricated using thermal evaporation on a glass substrate [13].…”
Section: Introductionsupporting
confidence: 75%
See 1 more Smart Citation
“…Specifically, with Bi 2 Te 3 thin film fabricated on glass substrates using thermal evaporation, the oscillation of the Seebeck coefficient depends on thickness below 100 nm. It becomes stable similar to bulk material value above 100 nm [10][11][12]. This result is also reproduced on BiSe thin films fabricated using thermal evaporation on a glass substrate [13].…”
Section: Introductionsupporting
confidence: 75%
“…All these studies share a common feature: each sample is made one by one, followed by sophisticated measurements [1,7,[10][11][12][13][14][15][16][17]. The properties of each sample depend on many fabrication details, such as the substrate temperature, its surface cleanliness, the stoichiometry of each component, vacuum chamber pressure, or cross-contaminations.…”
Section: Introductionmentioning
confidence: 99%
“…For example, Mingo et al [55] showed an increase in PF of TE nanowires of various materials (InP, GaAs, InAs and InSb) as the wire thickness became smaller. By far the thinnest Bi2Te3 thin-film study, around 18 nm with S ≈ 100 µV/K, was reported by Rogacheva et al [56] using thermal evaporation onto a hot substrate as the deposition method. Such a relationship opens up the exciting possibility of improved TE properties for very thin films, which would also have the manufacturing advantage of high deposition throughputs, to keep down the manufacturing cost.…”
Section: Introductionmentioning
confidence: 99%