1988
DOI: 10.1063/1.341533
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Raman scattering studies of chemical-vapor-deposited cubic SiC films of (100) Si

Abstract: Raman backscattering studies for a series of cubic SiC (3C-SiC) single-crystal films grown on (100)Si by way of chemical vapor deposition (CVD) with SiC film thicknesses dSiC from 600 Å to 17 μm are performed. Raman spectra of samples with dSiC>4 μm show a sharp and strong feature which obeys the selection rule for the 3C-SiC LO(Γ) phonon line. The Raman signals from the SiC film and the Si substrate show the same polarization behavior which confirms that the crystalline orientations of the Si substrate… Show more

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Cited by 174 publications
(89 citation statements)
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“…On the other hand, the preparation of mesoporous silicon carbide with a unique stability and strength using hard templates has attracted considerable interest. [4][5][6][7][8] However, hard-template routes are not suitable for the industrial production of powder materials due to engineering difficulties, and require a harmful etching step, most commonly with strong acid, which limits the coating processiblity to substrates. Therefore, soft-template routes using surfactants and block copolymers have attracted substantial attention for the creation of well-ordered nanostructured materials with facile applications on a large scale.…”
mentioning
confidence: 99%
“…On the other hand, the preparation of mesoporous silicon carbide with a unique stability and strength using hard templates has attracted considerable interest. [4][5][6][7][8] However, hard-template routes are not suitable for the industrial production of powder materials due to engineering difficulties, and require a harmful etching step, most commonly with strong acid, which limits the coating processiblity to substrates. Therefore, soft-template routes using surfactants and block copolymers have attracted substantial attention for the creation of well-ordered nanostructured materials with facile applications on a large scale.…”
mentioning
confidence: 99%
“…The material is typically free of micro cracks or other large flaws, but atomic layer stacking faults on the {111} planes are common. There is no porosity in this CVD SiC, and the material has essentially theoretical density (approximately 3.21 g/cm 3 ). Results of the quantitative analysis on the DZ width and defect microstructures examined in the regions well away from the DZ are summarized in Table I.…”
Section: Introductionmentioning
confidence: 99%
“…Silicon carbide (SiC) in various forms is considered a promising structural material for nuclear, 1, 2 electronic and optoelectronic devices applications, 3 because of its high thermal stability, excellent resistance to chemical attack, high thermal conductivity, and high electron saturation drift velocity. While in use or production, SiC is subjected to neutronirradiation or ion-irradiation of dopants which can produce the Frenkel pairs both in the silicon and carbon sublattices in addition to a clustered defects and antisite defects.…”
Section: Introductionmentioning
confidence: 99%
“…Before heat treatment, the Raman spectrum of the un-indented surface ( Fig. 2(a), curve I) shows two strong characteristic peaks centered at 796 and 972 cm À1 , which are attributed to the first order of transverse optical (TO) and longitudinal optical (LO) phonons of b-SiC [22,23]. Two additional weak peaks centered at 1524 and 1713 cm À1 represent the second-order Raman scattering of b-…”
Section: Indentation Recoverymentioning
confidence: 99%