“…After the first report of a silylene-borane adduct, followed by the Si-insertion into the B–C bond by Metzler and Denk, a stock of compounds with the Si–B bonds have been isolated by utilizing different boron sources. ,,− It is noteworthy to mention that the access to silylboranes via the reaction of silylene with borane precursors is very much desired, which otherwise involves a tedious synthetic approach. − However, the reported reactions mainly utilized either RBX 2 or R 3 B type of precursors. − ,,, There are very few reports where BX 3 or R 2 BX (X = F, Cl, Br) boron substrates are reacted with the Si(II) compounds, − ,, and only one report on disilene reaction with haloboranes (B-chlorocatecholborane and B-chloropinacolborane) reported by Tokitoh and co-workers . Recently, few reports appeared on the oxidative addition of the Lewis acidic boron halides to the Si(II) center of NHSi and amidinato bis-silylene, resulting in the ring expansion via the insertion of boron atom into the Si(II)–N bond. ,, Therefore, we planned to explore the reactivity of 1 toward some other boron halides. Treatment of 1 with 2 equiv of BCl 3 in toluene at room temperature led to the formation of 2 as a major product (Scheme ) with some unidentified products in a small amount.…”