1997
DOI: 10.1016/s0168-583x(97)00467-9
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Reactivity of the HSi (1 1 1) surface

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Cited by 58 publications
(59 citation statements)
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“…annealed at 700 • C (Si(1 1 1) C 5 /700 • ). In general agreement with previously published results [16][17][18], EW XPS showed no signicant difference between the Si(1 1 1) H and Si(1 1 1) C 5 samples, while the EW XPS was significantly higher for the Si(1 1 1) C 5 /700 • material because of the added contribution to the spectrum from the Si(1 1 1) (7 × 7) reconstruction. The PE max values of these three spectra were constant to within 0.1 eV because all the spectra were dominated by the bulk Si peak.…”
Section: Introductionsupporting
confidence: 92%
“…annealed at 700 • C (Si(1 1 1) C 5 /700 • ). In general agreement with previously published results [16][17][18], EW XPS showed no signicant difference between the Si(1 1 1) H and Si(1 1 1) C 5 samples, while the EW XPS was significantly higher for the Si(1 1 1) C 5 /700 • material because of the added contribution to the spectrum from the Si(1 1 1) (7 × 7) reconstruction. The PE max values of these three spectra were constant to within 0.1 eV because all the spectra were dominated by the bulk Si peak.…”
Section: Introductionsupporting
confidence: 92%
“…Though certainly disturbing, this discrepancy is not particularly large, especially if compared with discrepancies obtained in similar analyses (ca 20 instead of 4, for pentylterminated 111 silicon 41 ). Nonetheless, if we want to stress the analysis to make up for this anomaly, we may assume one or the other of the following hypotheses: the presence of adventitious species with C 0 /C ý ratio higher than 7; or line shapes for C or C ý differing from Gaussian.…”
Section: Making Up For the Anomalies Of The Enized Surfacesmentioning
confidence: 61%
“…[20][21][22][23][24][25] These chlorination methods start from the wet-chemically prepared H-terminated silicon surface. Wet chemical silicon chlorination methods have been described in the liquid phase using phosphorus pentachloride ͑PCl 5 ͒ and a radical initiator as a Cl radical source.…”
Section: Introductionmentioning
confidence: 99%
“…Wet chemical silicon chlorination methods have been described in the liquid phase using phosphorus pentachloride ͑PCl 5 ͒ and a radical initiator as a Cl radical source. [21][22][23][24][25][26] Gas phase methods, either in the dark 27 or using UV light in a low pressure chamber, 24 have also been demonstrated. Relatively little structural characterization has been performed to date on such chlorinated Si surfaces.…”
Section: Introductionmentioning
confidence: 99%