Proceedings of the 40th Annual Design Automation Conference 2003
DOI: 10.1145/775832.775901
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Recent advances and future prospects in single-electronics

Abstract: We will introduce new developments in single-electron logic technology and review a few clever applications made possible when single-electron transistors are combined with CMOS.

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Cited by 22 publications
(31 citation statements)
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“…As elucidated in Working Modes of the Proposed SQDSPD, the operation of the SQDSPD relies on the successful quantum confinement of a single electron or a single hole in the QD. Like in SETs, the strength of the quantum confinement is directly related to the barrier thickness and height, and can be measured by a phenomenological quantity “tunnel resistance” in the small bias limit . To achieve a good confinement for the single charges in the QD, it requires that the tunnel resistance R T satisfies the relationship R T ≫ h / e 2 ≈ 25.8 kΩ, where h is the Planck constant and e is the elementary charge.…”
Section: Discussionmentioning
confidence: 99%
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“…As elucidated in Working Modes of the Proposed SQDSPD, the operation of the SQDSPD relies on the successful quantum confinement of a single electron or a single hole in the QD. Like in SETs, the strength of the quantum confinement is directly related to the barrier thickness and height, and can be measured by a phenomenological quantity “tunnel resistance” in the small bias limit . To achieve a good confinement for the single charges in the QD, it requires that the tunnel resistance R T satisfies the relationship R T ≫ h / e 2 ≈ 25.8 kΩ, where h is the Planck constant and e is the elementary charge.…”
Section: Discussionmentioning
confidence: 99%
“…Using the Wentzel–Kramers–Brillouin (WKB) approximation, the tunnel resistance is linked to the barrier thickness through the following equations: where ℏ is the reduced Planck constant, | T | 2 is the tunneling probability through the barrier, D i and D f are, respectively, the density of states on the initial side and on the final side of the tunnel barrier, d is the barrier thickness, m * is the electron or hole effective mass in the tunnel barrier, V ( y ) is the potential energy profile of the barrier for the electron or the hole, and E y is the carrier kinetic energy in the y direction. For the R T estimation, constant V ( y )′ s equal to the band offsets shown in Figure b–e were used.…”
Section: Discussionmentioning
confidence: 99%
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