2008
DOI: 10.2174/2212797610801010022
|View full text |Cite
|
Sign up to set email alerts
|

Recent Innovations in Wall Shear Stress Sensor Technologies

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
2
0

Year Published

2011
2011
2019
2019

Publication Types

Select...
4
3

Relationship

0
7

Authors

Journals

citations
Cited by 11 publications
(2 citation statements)
references
References 0 publications
0
2
0
Order By: Relevance
“…The absence of electronic connections at the device location mitigates susceptibility to electromagnetic interference (EMI). 12 Environmental factors such as humidity and temperature can cause measurement drifts in the capacitive and piezoresistive techniques. The challenge for optical techniques is to develop a robust package capable of wall shear stress measurements in realworld applications.…”
Section: Introductionmentioning
confidence: 99%
“…The absence of electronic connections at the device location mitigates susceptibility to electromagnetic interference (EMI). 12 Environmental factors such as humidity and temperature can cause measurement drifts in the capacitive and piezoresistive techniques. The challenge for optical techniques is to develop a robust package capable of wall shear stress measurements in realworld applications.…”
Section: Introductionmentioning
confidence: 99%
“…Measurement of the shear stress at a wall in a fluid is indispensable for understanding the flow dynamics and for its active control. 1 Many flow phenomena involve small-scale structures, such as a boundary layer. The boundary layer thickness decreases as the Reynolds number of the flow increases.…”
mentioning
confidence: 99%