Recent performance results of Nikon immersion lithography tools

Hazelton, Andrew J.; Shiraishi, Kenichi; Wakamoto, Shinji; Ishii, Yuuki; Okumura, Masahiko; Magome, Nobutaka; Suzuki, H.

doi:10.1117/12.771823

Cited by 6 publications

(3 citation statements)

References 2 publications

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“…Then, the dose and focus offset are calculated by the analysis software. The calculation method using scatterometry has been developed by Hitachi High-Technologies and reported in previous papers [4], [5], [6], [7]. Using the calculated dose and focus offset maps, CDU Master generates a sub-recipe that includes high order optimum dose and focus correction values for each exposure field.…”

Section: Improving CD Uniformity By Dose and Focusmentioning

confidence: 99%

Process Optimization Using OPE-Master and CDU Master

et al. 2013

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OPE matching and CD-Uniformity control have become inevitable steps for most of high volume manufacturing(HVM) of a state-of-the-art devices. OPE matching is a step to match CDs of various patterns from different scanners or steppers. CD-Uniformity control is to stabilize CDs across exposure fields, across wafers and across lots, for HVMs. At a current OPE matching, one usually collects tool properties from each matching tool and import them into simulation software they are using to improve its prediction accuracy. However, generally speaking, this is a time and human resource consuming process, because data acquisition from scanners usually take a lot of time of both human and machine. Furthermore, what makes it more difficult is that an OPE matching, in most cases, requires several iterations. In this paper, we will introduce our latest software named OPE-Master. By employing the software, we can expect following merits. Firstly, with the help of the software, one can be able to automatically import machine properties. This means we can expedite the iterations without sacrifice of the accuracy. Secondly, one can also be able to get better solutions, because it uses all possible adjustment knobs, some of which are ones that unable to be accessed by a third party softwares, with the help of newly developed optimization algorithm that uses a hybrid method of nonlinear optimization and rigorous simulation. Finally, intuitive interface of the software makes it possible for an engineer without much optical simulation experiences to do an OPE matching simulation. In this paper, we will also introduce one of our latest software, called CDU-Master, which will be used to control CD uniformities for a HVM. CDU-Master can analys CDs from various metrology tools, such as, CD-SEMs, OCDs or a macro inspection tools(AMI, for example). CDU-Master can decompose CD errors into focus and dose errors and then derives parameters to correct CDs. One can expect extremely high accuracy of the decomposition, because, CD-SEM as an example, it uses all possible information such as CDs and pattern 3D structure information. The correction parameters, which may include very high order coefficients to be able to deal with very high spatial frequency distribution of errors across a field or across a wafer, will be converted into a format that can be recognized by scanners and then can be exported to scanners automatically, by the software.

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Section: Improving CD Uniformity By Dose and Focusmentioning

confidence: 99%

Process Optimization Using OPE-Master and CDU Master

et al. 2013

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“…Stressinduced birefringence is a product of fourth rank piezo-optical tensor ijmn (1) and second rank stress tensor T mn . In our case, because state-of-the-art projection lenses used in lithography have considerably large mass, we cannot circumvent the stress-induced birefringence completely in a gravity field because of the force acting on the lens supported mechanically.…”

Section: Vectorial Effect and Birefringencementioning

confidence: 99%

“…In order to print a line-and-space pattern of 40 nm, the numerical aperture (NA) of the projection lens (PL) has been increased to 1.3 by using immersion optics. 1 As a result, the vectorial effect has become sensitive and vectorial fingerprint with higher accuracy has been required for effective image forming simulation. Even the stress-induced birefringence of SiO2 is not negligible today.…”

Section: Introductionmentioning

confidence: 99%

True polarization characteristics of hyper-NA optics excluding impact of measurement system

et al. 2009

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High lens numerical aperture for improving the resolution of a lithographic lens requires a high incident angle of exposure light in resist, which induces the vectorial effect. As a result, the vectorial effect has become more sensitive and vectorial fingerprint with higher accuracy has been required for effective image forming simulation. We successfully obtained true polarization characteristics of projection optics without the effect of measurement optics for more accurate image forming simulation. Accuracy of the result of separating Jones matrix of projection optics and that of measurement optics are presented.

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Improved model for liquid loss at a dynamic contact line including behaviors of high-index fluids

Harder

Shedd

2008

J. Micro/Nanolith. MEMS MOEMS

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Recent performance results of Nikon immersion lithography tools

Cited by 6 publications

References 2 publications

Process Optimization Using OPE-Master and CDU Master

Process Optimization Using OPE-Master and CDU Master

True polarization characteristics of hyper-NA optics excluding impact of measurement system

Improved model for liquid loss at a dynamic contact line including behaviors of high-index fluids

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