2011
DOI: 10.1016/j.optlaseng.2011.01.024
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Recursive wavefront aberration correction method for LCoS spatial light modulators

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Cited by 23 publications
(15 citation statements)
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“…Next, we want to analyze their validity in case there are instabilities or fluctuations in the linear retardance, as it is the case in digitally addressed LCoS devices [12]- [14] . As a first approximation we may consider a triangular profile for the periodic variation of retardance with time ( ) t Γ , as shown in Fig.…”
Section: Theoretical Developmentmentioning
confidence: 99%
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“…Next, we want to analyze their validity in case there are instabilities or fluctuations in the linear retardance, as it is the case in digitally addressed LCoS devices [12]- [14] . As a first approximation we may consider a triangular profile for the periodic variation of retardance with time ( ) t Γ , as shown in Fig.…”
Section: Theoretical Developmentmentioning
confidence: 99%
“…Different measurement methods have been proposed and demonstrated to characterize the phase-shift versus voltage in LCoS devices [12]- [14] . Some of these methods provide full polarimetric characterization and are based on Stokes-Mueller polarimeters [12] [13] .…”
Section: Introductionmentioning
confidence: 99%
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“…Recently, due to the cost reduction of these devices, wavefront correction systems have widened their application to other research areas such as microscopy [2], ophthalmology [3], optical communication [4,5] and even lithography steppers [6,7]. One of the reasons of the cost reduction is the development of new tools that are able to modify the wavefront of an optical wave, such as electrostatic membrane mirror [8], bimorph piezoelectric mirror [9] and spatial light modulator (SLM) [10,11]. In AO systems, the most used wavefront correction device is still a deformable mirror (DM).…”
Section: Introductionmentioning
confidence: 99%
“…In optical traps, poor focal spot characteristics lead to smaller trap stiffness and distorted force field [27,28]. Wavefront distortion determination methods may apply wavefront sensors [29]- [31], interferometry [24] or monitor focal spot distribution [26,28]; the correction may apply Zernike polynomials [26,28,31], perform the correction in domains of the SLM [32,33] or apply a LaguerreGauss beam to optimize the wavefront [25]. The correction can even be performed for large area SLMs [34].…”
Section: Introductionmentioning
confidence: 99%