2009
DOI: 10.1143/jjap.48.08hk01
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Reduction of Leakage Currents in Bottom-Gate N-Channel Metal-Induced Crystallization through a Cap Layer Polycrystalline Silicon Thin-Film Transistors by Applying Off-Bias Stress

Abstract: A nonthermal plasma produced by the streamer corona discharge at an atmospheric pressure was investigated for the treatment of fluorocarbon. The effective treatment of fluorocarbons was performed by controlling the discharge parameters of the plasma. The decomposition rate of fluorocarbon was investigated by varying (a) discharge modes, (b) dilution gases and (c) discharge characteristics, that is, applied voltage V A-K of the main discharge gap and its steepness dV A-K =dt. The maximum decomposition rate of 9… Show more

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