Zinc oxide-based transparent conductive oxide films prepared by pulsed magnetron sputtering from powder targets: Process features and film properties Stress evolution during growth in direct-current-sputtered zinc oxide films at various oxygen flows J. Appl. Phys. 98, 073514 (2005); 10.1063/1.2061888In situ measurement of mechanical stress in polycrystalline zinc-oxide thin films prepared by magnetron sputtering Al-doped zinc oxide films deposited by simultaneous rf and dc excitation of a magnetron plasma: Relationships between plasma parameters and structural and electrical film properties