1998
DOI: 10.1016/s0042-207x(98)00273-5
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Reduction of residual stress for ZnO/Al thin films on glass substrate prepared by radio frequency magnetron sputtering

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Cited by 8 publications
(2 citation statements)
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“…20 Hence we have focused on the dependence of strain and structure on total pressure and oxygen flow in our study. If they are too high, delamination of the films may occur, or the substrate may even crack.…”
Section: Introductionmentioning
confidence: 99%
“…20 Hence we have focused on the dependence of strain and structure on total pressure and oxygen flow in our study. If they are too high, delamination of the films may occur, or the substrate may even crack.…”
Section: Introductionmentioning
confidence: 99%
“…Considering the expensive equipment and demanding process requirements of MBE, PLD, MOCVD, etc., this paper attempts to grow ZnMgO/ZnO heterojunctions on (100)Si substrate using RF magnetron sputtering technique based on the successful preparation of high quality ZnO and ZnMgO thin films [12][13][14] , and focuses on the crystal quality and luminescence properties of ZnMgO/ZnO heterojunctions.…”
Section: Introductionmentioning
confidence: 99%