1983
DOI: 10.1016/0379-6787(83)90066-2
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Relative influence of grain boundaries and intragrain defects on the photocurrents obtained with bridgman polysilicon

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1983
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Cited by 8 publications
(4 citation statements)
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“…recombination velocity, the grain doping level... The dispersion of the experimental results concerning the measurements of the short-circuit photocurrent as a function of the effective diffusion length [3,6] must not be only ascribed to experiment errors ; it can be at least partly explained by this theoretical result.…”
Section: Base Doping Concentration Influence -mentioning
confidence: 99%
See 1 more Smart Citation
“…recombination velocity, the grain doping level... The dispersion of the experimental results concerning the measurements of the short-circuit photocurrent as a function of the effective diffusion length [3,6] must not be only ascribed to experiment errors ; it can be at least partly explained by this theoretical result.…”
Section: Base Doping Concentration Influence -mentioning
confidence: 99%
“…Polycrystalline silicon is different from monocrystalline silicon essentially due to the presence of grain boundaries (gb) which act as recombination centres for excess carriers [1,2] and which contribute to a marked decrease of solar cell efficiencies [3][4][5][6]. The gb recombination of the excess carriers takes place via the gb interface states which can be due to the dangling bonds, the dislocations, or the impurities segregated or diffused into the grain boundaries.…”
mentioning
confidence: 99%
“…Therefore, in the past years, research effort has primarily been devoted to tailoring grain boundaries (GBs) for favorable defect properties and phase distribution. Nevertheless, the fundamental behaviors and effects of intragrain defects and impurities have been rarely studied, although they have been known essential to semiconductors in general 15,16 . One major hurdle in this research direction is to reliably image the microstructure and dynamics of intragrain defects and impurities in perovskites 3,[17][18][19][20] .…”
mentioning
confidence: 99%
“…We have previously shown that effective diffusion lengths in polysilicon are dependent on grain boundary and dislocation densities [8], and also that in large grained materials the influence of intragrain defects becomes predominant, when their density is sufficiently large. Dislocations and grain boundaries can act as efficient recombination sites and it is believed that the structure of high angle grain boundaries may be described in terms of a dense array of lattice dislocations [9].…”
mentioning
confidence: 99%