1984 International Electron Devices Meeting 1984
DOI: 10.1109/iedm.1984.190639
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Reliability in MOS integrated circuits

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Cited by 17 publications
(3 citation statements)
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“…Better understanding and trade-off studies are necessary; then optimization in LDD design and process can be achieved. Hot-electron-induced deg radation and other reliability concerns such as thin oxide quality and electromigration may place funda mental limits in scaling CMOS devices to the submicron regime [62]. In CMOS isolation, both parasitic FETs and bipolars must be considered in order to prevent field inversion, punch through, and latch-up.…”
Section: Summary and Future Trendsmentioning
confidence: 99%
“…Better understanding and trade-off studies are necessary; then optimization in LDD design and process can be achieved. Hot-electron-induced deg radation and other reliability concerns such as thin oxide quality and electromigration may place funda mental limits in scaling CMOS devices to the submicron regime [62]. In CMOS isolation, both parasitic FETs and bipolars must be considered in order to prevent field inversion, punch through, and latch-up.…”
Section: Summary and Future Trendsmentioning
confidence: 99%
“…Extensive research in the field of neuromorphic engineering in recent years has led to the development of various bioinspired circuits on silicon chips using advanced CMOS technology nodes [6]- [13]. Therefore, it is notable to consider reliability issues such as Bias Temperature Instability (BTI) and Hot Carrier Injection (HCI) [14]- [17] at these advanced nodes. BTI leads to the shift of device parameters like the threshold voltage (ΔVTH), drain current (ID), subthreshold slope (ΔS), transconductance (gm) because of gradual accumulation of charges at or near gate insulator [18]- [24].…”
Section: Introductionmentioning
confidence: 99%
“…Extensive research in the field of neuromorphic engineering in recent years has led to the development of various bioinspired circuits on silicon chips using advanced CMOS technology nodes [6]- [13]. Therefore, it is notable to consider reliability issues such as Bias Temperature Instability (BTI) and Hot Carrier Injection (HCI) [14]- [17] at these advanced nodes. BTI leads to the shift of device parameters like the threshold voltage (ΔVTH), drain current (ID), subthreshold slope (ΔS), transconductance (gm) because of gradual accumulation of charges at or near gate insulator [18]- [24].…”
Section: Introductionmentioning
confidence: 99%