Reliable optical characterization of e-beam evaporated TiO<sub>2</sub>films deposited at different substrate temperatures

Amotchkina, Tatiana V.; Trubetskov, Michael K.; Tikhonravov, Alexander V.; Angelov, Ivan B.; Pervak, Vladimir

doi:10.1364/ao.53.0000a8

Cited by 15 publications

(5 citation statements)

References 40 publications

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“…The refractive index at 500 nm was 2.436. As expected, the refractive index of the TiO 2 film deposited by PIAD was larger than that of EBE (2.358) and smaller than that of IBS (2.508) [28,29]. It was not surprising that the higher the deposition energy, the denser the film structure and the greater the refractive index.…”

Section: Single-layer Coatingssupporting

confidence: 61%

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Fabrication of Ultralow Stress TiO2/SiO2 Optical Coatings by Plasma Ion-Assisted Deposition

Guo

Kong

2020

Coatings

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Optical and mechanical properties of multilayer coatings depend on the selected layer materials and the deposition technology; therefore, knowledge of the performances of thin films is essential. In the present work, titanium dioxide (TiO2) and silicon dioxide (SiO2) thin films have been prepared by plasma ion-assisted deposition (PIAD). The optical, structural, and mechanical properties of thin films have been investigated using spectrometer/ellipsometer, X-ray diffraction (XRD), atomic force microscopy (AFM), and laser interferometer. The results show that TiO2 film fabricated by PIAD induces a high refractive index, wide optical band gap, amorphous structure, smooth surface, and tensile stress. In the case of SiO2 film, high bias voltage leads to dense structure and compressive stress. As an application, a three-wavelength high reflectance at 632.8, 808, and 1550 nm was optimized and deposited. The dependence of total stress in the multilayer on the substrate temperature was studied as well. In conclusion, it was demonstrated that PIAD is an effective method for the preparation of ultralow stress TiO2/SiO2 multilayer films. The achieved stress was as low as 1.4 MPa. The result could provide guidance to the stress optimization of most optical components without prefiguring, backside coating, and postdeposition treatments.

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Section: Single-layer Coatingssupporting

confidence: 61%

“…The extinction coefficient k(λ) was obtained from spectrophotometric measurement. On the other hand, in a high-absorption spectral range, the absorption coefficient α is related to the transmittance T and physical thickness d of thin-film based on Beer's law [29]:…”

Section: Single-layer Coatingsmentioning

confidence: 99%

Fabrication of Ultralow Stress TiO2/SiO2 Optical Coatings by Plasma Ion-Assisted Deposition

Guo

Kong

2020

Coatings

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“…For each single layer, values of the refractive index n, the extinction coefficient k and the thicknesses of the coatings have been extracted from both fitted transmittance and reflectance data using the Optilayer module of the Optichar software, version 5.82 [39,40]. The transmission and reflectance spectra of all thin film coatings were measured in the wavelength range of 350 nm to 2200 nm using a Perkin Elmer Lambda 900 spectrophotometer.…”

Section: Optical Characterisationmentioning

confidence: 99%

“…The refractive index n and the extinction coefficient k of the coatings are respectively fitted by the Cauchy model or normal dispersion and the exponential model described in Eq. (2) [40,41]:…”

Section: Optical Characterisationmentioning

confidence: 99%

Comparative study of dielectric coating materials for micro-cavity applications

Sidqi

Clark

Buller

et al. 2019

Opt. Mater. Express

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We study the potential of common dielectric coating materials used for the fabrication of high reflectance mirrors in micro-cavity devices used in the visible region. We examine materials grown using E-beam and thermal evaporation and magnetron sputtering. The refractive indices and the extinction coefficients of the coatings were calculated from transmission and reflectance spectrophotometric data. The surface roughness of single layer coatings was measured using atomic force microscopy and the scatter of the thin film coatings was approximated from roughness measurements.

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“…Reverse engineering of electron-beam deposited TiO2/SiO2 coatings is challenging since refractive indices of evaporated TiO2 layers are dependent on deposition conditions [1,2] and sometimes vary from layer to layer [1]. In the process of theoretical design, nominal refractive indices are often employed.…”

Section: Introductionmentioning

confidence: 99%

Reliable post-production characterization of TiO2/SiO2 electron-beam optical coatings based on multi-sample photometric and ellipsometric data

Amochkina,

Trubetskov,

Janicki

et al. 2024

Advances in Optical Thin Films VIII

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The study focuses on reliable reverse engineering of electron-beam deposited TiO2/SiO2 coatings. It is known that optical constants of evaporated TiO2 films are dependent on deposition conditions and may vary from layer to layer. Also, the nominal optical constants, used during the theoretical designing, may differ from the actual optical constants of coating layers, determined based on characterization of thicker single layers. Typically, post-production characterization of ebeam evaporated coatings is based on spectral photometric or/and ellipsometric data measured ex-situ. The study reports a new reliable algorithm that allows reliable estimation of layer thicknesses and optical constants based on ex-situ measurements. The reliability of the results is verified using a specially produced unique set of samples including single layers identical to the ones included in the multilayer sample. The obtained results, based on the photometric and ellipsometric data, are in correspondence with each other. The algorithm delivers practical results and avoids overfitting.

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Reliable optical characterization of e-beam evaporated TiO₂films deposited at different substrate temperatures

Cited by 15 publications

References 40 publications

Fabrication of Ultralow Stress TiO2/SiO2 Optical Coatings by Plasma Ion-Assisted Deposition

Fabrication of Ultralow Stress TiO2/SiO2 Optical Coatings by Plasma Ion-Assisted Deposition

Comparative study of dielectric coating materials for micro-cavity applications

Reliable post-production characterization of TiO2/SiO2 electron-beam optical coatings based on multi-sample photometric and ellipsometric data

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Reliable optical characterization of e-beam evaporated TiO2films deposited at different substrate temperatures

Cited by 15 publications

References 40 publications

Fabrication of Ultralow Stress TiO2/SiO2 Optical Coatings by Plasma Ion-Assisted Deposition

Fabrication of Ultralow Stress TiO2/SiO2 Optical Coatings by Plasma Ion-Assisted Deposition

Comparative study of dielectric coating materials for micro-cavity applications

Reliable post-production characterization of TiO2/SiO2 electron-beam optical coatings based on multi-sample photometric and ellipsometric data

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Reliable optical characterization of e-beam evaporated TiO₂films deposited at different substrate temperatures