Replication of DNA submicron patterns by combining nanoimprint lithography and contact printing

Wang, Yadong; Goh, Shook Hui; Bi, Xinyan; Yang, Kun‐Lin

doi:10.1016/j.jcis.2009.02.010

Cited by 23 publications

(13 citation statements)

References 27 publications

(28 reference statements)

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Given these considerations, screen printing usually only works well for applications where fewer types of liquids need to be printed, such as DNA synthesis, where only four different nucleotides need to be printed. 12,13 Microfluidic liquid delivery utilizes microfluidic chip designed to perform multiple liquid handling tasks, such as solution mixing, 14 gradient generation, 15 or breaking into droplets, 16,17 under a submillimeter regime. Microfluidics provides a multifunctional platform for lab-on-a-chip analysis, and has been applied to many areas, including celldrug interaction, PCR, and clinical diagnostics.…”

Section: Introductionmentioning

confidence: 99%

Microfluidic Pneumatic Printed Sandwiched Microdroplet Array for High-Throughput Enzymatic Reaction and Screening

et al. 2020

View full text Add to dashboard Cite

Section: Introductionmentioning

confidence: 99%

Microfluidic Pneumatic Printed Sandwiched Microdroplet Array for High-Throughput Enzymatic Reaction and Screening

et al. 2020

View full text Add to dashboard Cite

“…1,2 Compared with the conventional photolithography and other NGL techniques, such as the extreme ultraviolet, electron-beam, ion-beam, and X-ray lithography, NIL has a unique competitive advantage and extensive application prospects in the fabrication of micro/nano structures. [3][4][5][6][7] The key difference between them is that NIL is a contact patterning process based on the deformation of polymer materials and can reach a very high resolution that is not limited by the light diffraction or scattering. 8 Parallel surface contact between the template with predefined micro/nano patterns and the substrate that accepts the patterns is very critical for pattern fidelity in NIL, whereas the nonparallel surface contact will lead to the uneven patterns on the substrate.…”

Section: Introductionmentioning

confidence: 99%

A force-decoupled compound parallel alignment stage for nanoimprint lithography

Sun

Chen

Zhou

et al. 2013

Review of Scientific Instruments

View full text Add to dashboard Cite

This paper presents the development of a force-decoupled compound parallel alignment stage for nanoimprint lithography. Parallel alignment stage is a critical component of nanoimprint machine to implement the uniform surface contact between the template with predefined micro/nano patterns and the substrate that accepts the patterns. A combination of a high-stiffness spherical air bearing and a multi degree-of-freedom flexure-based mechanism is adopted in the parallel alignment stage. Apart from the parallel alignment function, the proposed stage can also endure a large imprinting force (more than 1000 N) but does not cause any damage to the delicate flexure-based mechanism. The stage performance is evaluated to satisfy the alignment requirement through the theoretical modeling and finite element analysis. Experiments are conducted on the parallel alignment stage to verify its performance on the transferred grating patterns with linewidth of 2.5 μm. This result demonstrates that the proposed approach can enhance the load capacity of the parallel alignment stage without degrading its alignment accuracy for nanoimprint lithography.

show abstract

“…lCP is simple to apply and has good versatility [8,[19][20][21][22][23][24]. It was introduced by Kumar and coworkers in 1993 for replicating patterns generated by photolithography [25].…”

Section: Introductionmentioning

confidence: 99%