Resist Removal by using Wet Ozone

Horibe, Hideo; Yamamoto, Masashi; Ichikawa, Tomokazu; Kamimura, Tomosumi; Tagawa, Seiichi

doi:10.2494/photopolymer.20.315

Cited by 29 publications

(22 citation statements)

References 6 publications

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“…On the other hand, ozone is applied to environmentally friendly cleaning techniques for water and semiconductor manufacturing [5][6][7][8][9][10][11][12]. Ozone water degrades compounds with C=C bond or benzene ring to carboxylic acid [13,14].…”

Section: Introductionmentioning

confidence: 99%

Effect of Temperature on Degradation of Polymers for Photoresist Using Ozone Microbubbles

Matsuura

Nishiyama

Sato

et al. 2016

J. Photopol. Sci. Technol.

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We studied about an effect of temperature on degradation of polymers for photoresist using ozone microbubbles as an environmentally friendly cleaning technique. The dissolved ozone concentration of ozone microbubbles was decreased with the increasing temperature because the solubility of ozone gas was decreased and self-decomposition of ozone in water was promoted. While, the reactivity between ozone and novolak resin was increased with the increasing temperature. Consequently, novolak resin was most efficiently removed at around 23 C. The activated energy for removal of novolak resin using ozone microbubbles was 23 kJ/mol determined from Arrhenius plots. Polyvinyl phenol was removed by ozone microbubbles, and its removal rate was comparable with that of novolak resin. Polymethyl methacrylate without C=C bond or benzene ring structure could not be removed by ozone microbubbles.

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Section: Introductionmentioning

confidence: 99%

Effect of Temperature on Degradation of Polymers for Photoresist Using Ozone Microbubbles

Matsuura

Nishiyama

Sato

et al. 2016

J. Photopol. Sci. Technol.

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“…As a result, large amounts of chemicals, such as H 2 SO 4 , H 2 O 2 , HCl, NH 4 OH, and amine solvents, are required in wet cleaning processes [6,7]. For safety and environmental reasons, the use of ozonized water is attracting attention as a viable method for removing organic contaminants, which has been conventionally removed by a high temperature sulfuric acid -hydrogen peroxide mixture (SPM) [8,9]. In terms of applications to semiconductor manufacturing, ozonized water cleaning systems are strongly desired as they provide enhanced removal rates for organic contaminants.…”

Section: Introductionmentioning

confidence: 99%

Effect of Microbubbles on Ozonized Water for Photoresist Removal

Takahashi

Horibe

Matsuura

et al. 2015

J. Photopol. Sci. Technol.

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The existence of microbubbles in ozonized water has been shown to significantly enhance the photoresist removal rate due to an elevated dissolved ozone concentration and a direct effect of the microbubbles relating to the radical generation. Additionally, the ozone microbubble solution was able to effectively remove a high-dose ion-implanted photoresist, which is extremely resistant to removal by ozonized water and other wet chemicals because of its amorphous carbon-like layer, or "crust". Electron spin resonance experiments were also performed without the influence of serious metal contamination and indicated the presence of hydroxyl radicals, which are thought to be formed by interaction of ozone with hydroxide ions adsorbed at the gas-water interface upon collapse of the microbubbles.

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“…On the other hand, ozone is applied to environmentally friendly cleaning techniques for water and semiconductor manufacturing [5][6][7][8][9][10][11][12][13][14]. Ozone-water degrade compounds with C=C bond or benzene ring to carboxylic acid [15,16].…”

Section: Introductionmentioning

confidence: 99%