Resist Removal by Using Wet Ozone

Horibe, Hideo; Yamamoto, Masashi; Ichikawa, Tomokazu; Kamimura, Tomosumi; Tagawa, Seiichi

doi:10.2494/photopolymer.2.315

Cited by 2 publications

(2 citation statements)

References 6 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…O 3 has a strong oxidation power and is applied to waste water treatment and semiconductor manufacturing [5][6][7][8][9][10][11]. O 3 water degrades compounds with C=C bond to carboxylic acid [12,13]. Additionally, O 3 generates reactive oxygen species through self-decomposition in water.…”

Section: Introductionmentioning

confidence: 99%

Degradation of Poly(acrylic acid) in Aqueous Solution by Using O<sub>3</sub> Microbubble

Miyazaki

Nishiyama

Sato

et al. 2018

J. Photopol. Sci. Technol.

Self Cite

View full text Add to dashboard Cite

Polyacrylic acid (PAA) aqueous solution was treated with O 3 microbubbles and O 3 water, there was no difference in decrease in molecular weight of PAA due to the presence or absence of microbubbles. Regardless of dissolved O 3 concentration, O 3 microbubbles alone did not cause reduction in total organic carbon (TOC) and mineralization did not proceed. In the advanced oxidation prosess with hydrogen peroxide added, the molecular weight and TOC decreased. It is considered that active oxygen is generated from hydrogen peroxide by advanced oxidation and PAA is decomposed. From these results, it is no considered generation of reactive oxygen species by microbubbles in the decomposition of PAA.

show abstract

Section: Introductionmentioning

confidence: 99%

Degradation of Poly(acrylic acid) in Aqueous Solution by Using O<sub>3</sub> Microbubble

Miyazaki

Nishiyama

Sato

et al. 2018

J. Photopol. Sci. Technol.

Self Cite

View full text Add to dashboard Cite

show abstract

“…Also, a small amount of water vapor condenses on the resist, due to the difference in temperature (ΔT = T 1 − T 2 ) between wet ozone (T 1 ) and Si wafer (T 2 ). The amount of water condensed on the resist was controlled by adjusting ΔT [19]. Figure 2 depicts the chemical reaction of the carbon-carbon double bond (C-C double bond) with ozone and the hydrolysis of ozonide.…”

Section: Introductionmentioning

confidence: 99%

Development of an Environmentally Friendly Resist-Removal Process Using Wet Ozone

Horibe

Goto

2012

International Journal of Polymer Science

Self Cite

View full text Add to dashboard Cite

We investigated the removal of polymers with various chemical structures and the removal of ion-implanted resists using wet ozone. The removal rates of polymers that have carbon-carbon (C–C) double bonds in the main chain were high. The main chain of these polymers may be decomposed. The removal rates of polymers that have C–C double bonds in the side chain were low. The benzene ring in the side chain changes into carboxylic acid, so their ability to dissolve in water increased. The polymers without C–C double bonds were not removed. Removal of B and P ion-implanted resists became difficult with increasing acceleration energy of ions at implantation. The resist with plastic-deformation hardness that was twice as hard as that of nonimplanted resist should be removed similarly to nonimplanted resist. Using TOF-SIMS, we clarified that the molecule of cresol novolak resin was destroyed and carbonized by ion implantation.

show abstract

Resist Removal by Using Wet Ozone

Cited by 2 publications

References 6 publications

Degradation of Poly(acrylic acid) in Aqueous Solution by Using O<sub>3</sub> Microbubble

Degradation of Poly(acrylic acid) in Aqueous Solution by Using O<sub>3</sub> Microbubble

Development of an Environmentally Friendly Resist-Removal Process Using Wet Ozone

Contact Info

Product

Resources

About