2011
DOI: 10.1016/j.sse.2010.10.006
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Resistance change in memory structures integrating CuTCNQ nanowires grown on dedicated HfO2 switching layer

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Cited by 9 publications
(3 citation statements)
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“…On the basis of CuTCNQ, the electric switching mechanism of the AgTCNQF 4 microrods is described. As shown in Scheme , an air gap or water meniscus was formed between the Au‐coated AFM tip and AgTCNQF 4 surface. Tip connection or atmosphere gap isolation determines the current signal on or off.…”
Section: Resultsmentioning
confidence: 99%
“…On the basis of CuTCNQ, the electric switching mechanism of the AgTCNQF 4 microrods is described. As shown in Scheme , an air gap or water meniscus was formed between the Au‐coated AFM tip and AgTCNQF 4 surface. Tip connection or atmosphere gap isolation determines the current signal on or off.…”
Section: Resultsmentioning
confidence: 99%
“…A number of studies have been devoted to MIM structures incorporating a (macro-)molecular layer in combination with a dedicated inorganic switching layer consisting of metal oxide [56,57] or metal halide [58]. Similar to metal oxide memory cells, these hybrid devices require an electroforming step before resistive memory effects become apparent.…”
Section: Hybrid Diodes Involving a Dedicated Inorganic Switching Layermentioning
confidence: 99%
“…In recent years, copper based compounds, such as copper oxide (Cu x O) [3,4], copper sulfide (Cu 2 S) [5] and copper organics (CuTCNQ) [6] have been integrated into RRAM devices since its compatibility with Cu interconnection process in complementary metal oxide semiconductor (CMOS) technology.…”
Section: Introductionmentioning
confidence: 99%