“…Metal oxides such as TiO x , [8,9,[40][41][42] NiO x , [32,[43][44][45][46] HfO 2 , [19,29,42] TaO x , [20,47,48] AlO x , [10,49] ZrO 2 , [15][16][17] ZnO x , [11,31,50] CuO, [6,51,52] SiO x , [18,34,53] and others are frequently used as materials for constructing the resistive layer due to their simple structure, larger bandgap, and better compatibility with the CMOS process. [54,55] At the same time, nitride such as AlN, [56,57] ZrN, [58] NiN, [59] and organic materials like Alq 3 [60] exhibit similar RS mechanisms to metal oxides, making them viable options for resistive materials. It is also important to note that metal ions exhibit higher solubility and diffusion coefficient in sulfide materials, such as As 2 S 3 , [61] Ag 2 S, [62] GeTe, [63] Cu 2 S, [64] GeS, [65] Ag-Ge-Se.…”