Review of ultra-precision optical interferential grating encoder displacement measurement technology for immersion lithography scanner

Lei-jie, 王磊杰 Wang; Ming, 张 鸣 Zhang; Yu, 朱煜 Zhu; Wei-nan, 叶伟楠 Ye; Fu-zhong, 杨富中 Yang

doi:10.3788/ope.20192709.1909

Cited by 7 publications

(2 citation statements)

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“…A dramatically reduced sensitivity to refractive index changes can be realized by using grating interferometers (GIs) 50–52 . The grating is placed vertically or with a certain angle to the incident lasers.…”

Section: Stage Position Measurementmentioning

confidence: 99%

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Mechanical system and dynamic control in photolithography for nanoscale fabrication: A critical review

Song

Chen

Huo³

et al. 2021

Int Journal of Mech Sys Dyn

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As one of the most advanced and precise equipment in the world, a photolithography scanner is able to fabricate nanometer-scale devices on a chip. To realize such a small dimension, the optical system is the fundamental, but the mechanical system often becomes the bottleneck. In the photolithography, the exposure is a dynamic process. The accuracy and precision of the movement are determined by the mechanical system, which is even more difficult to control compared with the optical system. In the mechanical system, there are four crucial components: the reticle and wafer stages, the linear motor, the metrology system, and the control system. They work together to secure the reticle and substrate locating at the correct position, which determines the overlay and alignment performance in the lithography. In this paper, the principles of these components are reviewed, and the development history of the mechanical system is introduced.

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Section: Stage Position Measurementmentioning

confidence: 99%

“…24 A dramatically reduced sensitivity to refractive index changes can be realized by using grating interferometers (GIs). [50][51][52] The grating is placed vertically or with a certain angle to the incident lasers. Therefore, with a single grating, a GI can achieve up to 6 DOF measurement in a compact area.…”

Section: Stage Position Measurementmentioning

confidence: 99%

Mechanical system and dynamic control in photolithography for nanoscale fabrication: A critical review

Song

Chen

Huo³

et al. 2021

Int Journal of Mech Sys Dyn

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Error correction algorithm for grating Moiré fringes based on QM-ANN

Chang,

Lu,

Guo

et al. 2024

Measurement

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Study on the Control of Micro-Environmental Parameters in Long Distance Laser Interferometry

Zhu

Nie

2021

J. Phys.: Conf. Ser.

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Fluctuation in environmental parameters has become an important factor affecting the performance of ultra precision measurement. Aiming at the long-distance and high-speed laser interferometer measurement system, a method combining structure design and closed-loop control is proposed to reduce the measurement error caused by environmental parameters. The uniform pressure structure is designed, and the control system of micro environmental parameters is established. The simulation and experimental research on the uniformity of temperature and pressure on the optical path measured by laser interferometer are carried out. The simulation and experimental results show that this method can achieve temperature uniformity and stability above 0.01°C and pressure uniformity and stability above 1Pa, and can be widely used in micro environment parameter control of long-distance ultra precision measurement.

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Review of ultra-precision optical interferential grating encoder displacement measurement technology for immersion lithography scanner

Cited by 7 publications

References 0 publications

Mechanical system and dynamic control in photolithography for nanoscale fabrication: A critical review

Mechanical system and dynamic control in photolithography for nanoscale fabrication: A critical review

Error correction algorithm for grating Moiré fringes based on QM-ANN

Study on the Control of Micro-Environmental Parameters in Long Distance Laser Interferometry

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