Rf magnetron sputtering of polypropylene

Stelmashuk, V.; Biederman, Hynek; Slavı́nská, D.; Trchová, Miroslava; Hlı́dek, P.

doi:10.1016/j.vacuum.2004.02.007

Cited by 27 publications

(19 citation statements)

References 24 publications

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“…Therefore, the PP target was not cycled to the open atmosphere. As found previously, the sputtered PP target after being exposed to the open atmosphere absorbed a lot of water vapor that was subsequently released in the following deposition run and incorporated into the deposited film 5…”

Section: Resultsmentioning

confidence: 63%

“…In the argon RF discharge the peaks can be assigned to argon ions: Ar + (40 amu), Ar 2+ (20 amu), to water (in residual gas and water incorporated in the target) H 2 O + (18 amu), OH + (17 amu), and H 3 O + (19 amu), hydrocarbons C n H m ( n = 1, 13–16 amu; n = 2, 25–30 amu, n = 3; 37–44 amu, etc.) and oxygen derivatives of hydrocarbons such as (C k H l O

_{italicm}^{+}

) 5. Nitrogen ions N + (14 amu), N

_{2}^{+}

(28 amu) and nitrogen‐containing species N x H

_{italicy}^{+}

, and C k H l N

_{italicm}^{+}

are observed in nitrogen plasma and in the mixture of nitrogen and argon.…”

Section: Resultsmentioning

confidence: 99%

“…The most intensive attention has been paid to PTFE 1. However, in recent years several other polymers have been considered for sputtering such as polyimide (PI), polyethylene (PE), and poly(propylene) (PP) 1–6. The deposition process of sputtering can be performed either in argon or in a so‐called self‐sputtering mode.…”

Section: Introductionmentioning

confidence: 99%

See 2 more Smart Citations

RF Magnetron Sputtering of Poly(propylene) in a Mixture of Argon and Nitrogen

Hanuš

Kousal

Choukourov

et al. 2007

Plasma Process. Polym.

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Poly(propylene) was RF sputtered in a working gas mixture of argon and nitrogen using planar magnetron. With nitrogen content in the mixture increasing from 0 to 100%, the deposition rate of plasma polymer films increased from 3 to 12 nm · min−1, the contact angle of water on sputtered plasma polymer films decreased from 62 to 37° and, according to FTIR measurements, the presence of NH and CN groups in these films increased. According to XPS, at 0% nitrogen in the working gas mixture the films contained more than 10 at.‐% of oxygen; with increasing content of nitrogen in the gas mixture this proportion steadily decreased whereas the nitrogen content in the film increased. When RF power was increased, the deposition rate and contact angle increased. Qualitative explanation of the deposition process is proposed.

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Section: Resultsmentioning

confidence: 63%

_{italicm}^{+}

) 5. Nitrogen ions N + (14 amu), N

_{2}^{+}

(28 amu) and nitrogen‐containing species N x H

_{italicy}^{+}

, and C k H l N

_{italicm}^{+}

are observed in nitrogen plasma and in the mixture of nitrogen and argon.…”

Section: Resultsmentioning

confidence: 99%

See 1 more Smart Citation

RF Magnetron Sputtering of Poly(propylene) in a Mixture of Argon and Nitrogen

Hanuš

Kousal

Choukourov

et al. 2007

Plasma Process. Polym.

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show abstract

“…Moreover, crosslinking of the polymer matrix can be used to eliminate this problem. [52] 2.1.3. Sputter Deposition.…”

Section: Evaporationmentioning

confidence: 99%

Metal‐Polymer Nanocomposites for Functional Applications

et al. 2010

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Nanocomposites combine favorable features of the constituents on the nanoscale to obtain new functionalities. The present paper is concerned with the preparation of polymer‐based nanocomposites consisting of metal nanoparticles in a polymer matrix and the resulting functional properties. Emphasis is placed on vapor phase deposition which inter alia allows the incorporation of alloy clusters with well defined composition and tailored filling factor profiles. Examples discussed here include optical composites with tuned particle surface plasmon resonances for plasmonic applications, magnetic high frequency materials with cut‐off frequencies well above 1 GHz, sensors that are based on the dramatic change in the electronic properties near the percolation threshold, and antibacterial coatings which benefit from the large effective surface of nanoparticles and the increased chemical potential which both strongly enhance ion release.

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“…Normally molecular chains are broken, leading to layers with an amorphous, undefi ned structure on the substrate. However, there are some reports of sputtered polymer layers like polytetrafl uoroethylene (PTFE) (Pratt and Lausman, 1972;Morrison and Robertson, 1973;Biederman et al ., 1977;, polyimide (PI) , polypropylene (PP) (Stelmashuk et al ., 2004) and polyethylene (PE) Kousal et al ., 2005). The deposited layers are structurally not identical to the polymer source materials but they basically consist of shorter fragments of the original material with strong cross linking .…”

Section: Rf Sputteringmentioning

confidence: 99%