2015
DOI: 10.1063/1.4926340
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Role of metal-oxide interfaces in the multiple resistance switching regimes of Pt/HfO2/TiN devices

Abstract: The multiple resistive switching of Pt/HfO2/TiN devices is demonstrated as a result of a competition between the switching at opposite metal/oxide interfaces. Three switching operation modes are demonstrated: clockwise (CW) switching (set for negative voltage and reset for positive voltage at Pt electrode), as already reported in literature for similar material stacks; counterclockwise (CCW) switching and complementary switching (CS) that consist in a set and a reset for increasing voltage of the same polarity… Show more

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Cited by 84 publications
(67 citation statements)
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“…Ti and TiN layers are deposited by magnetron sputtering and the HfO 2 layer is deposited by atomic layer deposition at 300 °C, as described elsewhere (Brivio et al, 2015; Frascaroli et al, 2015). The switching mechanism of the proposed memristor is filamentary (Brivio et al, 2014), i.e., it is based on the disruption and the restoration of a conductive filament formed inside the oxide.…”
Section: Methodsmentioning
confidence: 99%
“…Ti and TiN layers are deposited by magnetron sputtering and the HfO 2 layer is deposited by atomic layer deposition at 300 °C, as described elsewhere (Brivio et al, 2015; Frascaroli et al, 2015). The switching mechanism of the proposed memristor is filamentary (Brivio et al, 2014), i.e., it is based on the disruption and the restoration of a conductive filament formed inside the oxide.…”
Section: Methodsmentioning
confidence: 99%
“…Adding to the more frequently observed cf8 ‐BRS mode, a lower‐bias voltage f8 ‐BRS mode (reset process with TiN as anode) with lower resistance ratios (≤10) was also observed in similar devices . This f8 operation was further found to coexist with a complementary resistive switching (CRS) operation . Despite these various observations, the nature of partial coexistence of various switching modes and the conditions for the occurrence of quantization remain to be understood.…”
Section: Introductionmentioning
confidence: 91%
“…In order to achieve this goal, we have investigated as a model system a prototypical HfO 2 based RRAM device using Pt and TiN electrodes, which has been reported to exhibit reliable switching in several publications . In addition, this device type is particularly interesting due to multiple coexisting switching modes and polarities, as well as a large possible resistance window of operation, making it promising as multibit synaptic devices in neuromorphic computing . In the Pt/HfO 2 /TiN device configuration, with applied bias to Pt electrode, a stable cf8 ‐BRS mode has been most often reported.…”
Section: Introductionmentioning
confidence: 99%
“…2b) and 10 year retention at 175°C has been previously demonstrated [2]. As expected, the set transition is abrupt with a sudden current jump at about -0.8 V. The transition is limited by the instrumental current compliance at 1 mA that, together with the device design [4], prevents destructive breakdown. Such abrupt resistance transition is usually explained by a threshold switching event that triggers a fast selfaccelerated process of CF formation inside the oxide [8].…”
Section: Resultsmentioning
confidence: 62%
“…Pt/HfO 2 /TiN devices, displaying good memory performances [2]- [4], are usually characterized by abrupt set transitions from high to low resistance states (HRS to LRS) that require current compliance in order to prevent an uncontrolled growth of a conductive filament (CF). Only few examples of gradual set transition in the same device structure exist in literature.…”
Section: Introductionmentioning
confidence: 99%