The switching dynamics of filamentary Pt/HfO 2 /TiN memristive devices is managed through sub-threshold pulses in order to display gradual resistance decrease useful for analog logic computation based on spiking networks. Such memristive devices are known to display abrupt set transitions (resistance decrease) that require current limitation because of the triggering of a threshold switching event. In this report, we demonstrate the gradual resistance decrease driven by trains of identical sub-threshold pulses. The experimental finding is explained by a compact model considering a gradual closure of the filament interruption and a following lateral filament growth
IntroductionMemristive devices are now encountering a renewed interest for logic and for alternative computations, such as in spiking neuromorphic networks where analog behavior and gradual transitions are desirable[1]. Pt/HfO 2 /TiN devices, displaying good memory performances[2]-[4], are usually characterized by abrupt set transitions from high to low resistance states (HRS to LRS) that require current compliance in order to prevent an uncontrolled growth of a conductive filament (CF). Only few examples of gradual set transition in the same device structure exist in literature.[5] This fact is supposed to prevent their use for analog memristive applications. In this work, we demonstrate that a controlled resistance decrease can be induced by sub-threshold pulses, which allows a gradual resistance modulation. The result demonstrates the existence of a switching regime that differs from the usually known in the memory field and it is explained through a filamentary compact model that justify the resistance evolution. On the other hand, the result can pave the way for the exploitation of filamentary HfO 2 -based devices for neuromorphic architectures with memristive devices emulating the plasticity of biological synapses.
Results and DiscussionPt/HfO 2 /TiN are fabricated sequentially by 40 nm TiN sputtering deposition, 5 nm HfO 2 atomic layer deposition and 50 nm Pt sputtering deposition. 40 x 40 m 2 devices are patterned by optical lithography and Pt lift-off [2],[4] (fig . 1a). Devices are characterized in DC by Agilent B1500 semiconductor parameter analyzer and in pulsed operation by custom instrumentation [6]. After a current controlled forming process, Pt/HfO 2 /TiN devices display reliable resistance switching between LRS and HRS ( fig.2a), as a result of the formation and partial dissolution of a CF connecting the two electrodes ( fig. 1b)[7]. The resistance levels are stable during cycling ( fig. 2b) and 10 year retention at 175°C has been previously demonstrated [2]. As expected, the set transition is abrupt with a sudden current jump at about -0.8 V. The transition is limited by the instrumental current compliance at 1 mA that, together with the device design [4], prevents destructive breakdown. Such abrupt resistance transition is usually explained by a threshold switching event that triggers a fast selfaccelerated process of CF forma...