Roll-to-Roll UV Imprint for Bottom-up Transistor Fabrication

Abstract

We propose a design to fabricate transistors on flexible substrates in a bottom-up fashion using R2R UVimprint lithography. The design consists of a template composed of multilevel as well as gray level features, the later used to facilitate device interconnection. A hard mold is fabricated by LBR and a flexible Ni replica is done using Ni electroplating. The flexible stamp is used in the R2R UV imprint machine with PET as flexible substrate. Imprints were performed at a speed of 0.35m/min and show a high level of replication of the multilevel as well as gray level features.

Influence of growing system on nitrate accumulation in two varieties of lettuce and red radicchio of Treviso

“…Most often, the roller mold is patterned ( Figure a). This can be done either directly,161 or by patterning a flexible sheet mold162–164 or shim and wrapping, or respectively mounting to a blank roller 24, 165–167. Also, patterned molds spanning several rolls have been fabricated, so‐called belt molds 148.…”

“…The latter suffers from similar scaling limitations as batch mode imprinting, in that the mold still has to be scaled to the full size of the substrate 160. Furthermore, a classification in thermal168 and UV‐roller NIL (Figure 8c)162, 164, 165 can be made like in batch patterning.…”

Numerical Study on the Optimization of Roll-to-Roll Ultraviolet Imprint Lithography

“…R2R-UV-NIL is a process-based batch NIL used to replicate nano/micro-scale patterns from a surface of the patterned mold to a large area of the flexible or rigid substrate. Due to wide applications of R2R-UV-NIL in several fields, it has been studied broadly by numerous researchers working in the area of electronic devices [2], polarizers [3], transistors [4], and solar cells [5], etc. On the commercial scale, productivity in the development of flat display panels [6], biotechnological applications [7], and optoelectronic devices [8] is yet to meet with standards.…”

Single Layer Broadband Anti-Reflective Coatings for Plastic Substrates Produced by Full Wafer and Roll-to-Roll Step-and-Flash Nano-Imprint Lithography

“…Hence, typical resist materials are not designed for permanent application on substrates and, depending on the application, typically lack part of the required properties. In spite of a variety of studies performed in the past few years [ 53 , 54 , 55 , 56 , 57 , 58 , 59 , 60 , 61 ], NIL is not yet commonly used for large area, high-volume applications.…”