The scalability of thin-film transistors has been well documented, but there have been very few investigations into of the effects of device scalability in Schottky diodes. Indium-gallium-zinc-oxide (IGZO) Schottky diodes were fabricated with IGZO thicknesses of 50, 150 and 250 nm. Despite the same IGZO-Pt interface and Schottky barrier being formed in all devices, reducing the IGZO thickness caused a dramatic deterioration of the current-voltage characteristics, most notably increasing the reverse current by nearly five orders of magnitude. Furthermore, the forward characteristics display an increase in ideality factor and a reduction in barrier height. The origins of this phenomenon have been elucidated using device simulations. Firstly, when the semiconductor layer is fully depleted, the electric field increases with reducing thickness, leading to an increased diffusion current. However, the effects of diffusion only offer a small contribution to the huge variations in reverse current seen in the experiments. To fully explain this effect the role of inhomogeneities in the Schottky barrier height has been considered. Contributions from lower barrier regions (LBRs) are found to dominate the reverse current. The conduction band minimum below these LBRs is strongly dependent upon thickness and bias, leading to reverse current variations as large as several orders of magnitude. Finally, it is demonstrated that the thickness dependence of the reverse current is exacerbated as the magnitude of the inhomogeneities is increased, and alleviated in the limit where the LBRs are large enough not to be influenced by the adjacent higher barrier regions.In recent years, efforts to realise large-area flexible thinfilm electronics have branched out to incorporate the use of a large variety of materials [1][2][3]. Oxide semiconductors, particularly indium-gallium-zinc-oxide (IGZO), have emerged as leading candidates for application in future display technology [4]. IGZO has demonstrated excellent mobility and transparency [5], and can also be deposited at room temperature, making it compatible with flexible substrates [6]. Initially, most studies were focussed on thin-film transistors (TFTs) [7,8]. However, there is now a growing body of literature on IGZO Schottky diodes [9][10][11][12]. These efforts have led to the realisation of excellent electronic properties such as rectification ratios > 10 7 , barrier heights > 0.9 eV and ideality factors close to unity. Notable achievements include fabricating devices on flexible substrates [9], exhibiting gigahertz operating frequencies [12,13] Unlike TFTs, where scaling phenomena such as the short-channel effect are well documented [19,20], the effects of device scalability on IGZO Schottky diodes has received limited attention. So far, studies of IGZO Schottky diodes have been focused on the forward current, except work regarding the reverse breakdown voltage [21]. * Please address correspondence to A.Song@manchester.ac.uk Reducing the thickness of the IGZO should be beneficial ...