2009
DOI: 10.1007/978-0-387-78689-6_6
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Room Temperature Silicon Spin-Based Transistors

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Cited by 2 publications
(2 citation statements)
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“…Owing to its apparent advantages over other semiconductors, many groups tried to demonstrate phenomena attributed to spin transport in Si [31][32][33][34][35][36][37][38][39], but this was typically done with ohmic FM-Si contacts and two-terminal magnetoresistance measurements or in transistor-type devices [40,41], which are bound to fail owing to the 'fundamental obstacle' for ohmic spin injection mentioned in §1 [1][2][3][4]. Although weak spin-valve effects are often presented, no evidence of spin precession is available so the signals measured are ambiguous at best [42,43].…”
Section: Spins In Siliconmentioning
confidence: 99%
“…Owing to its apparent advantages over other semiconductors, many groups tried to demonstrate phenomena attributed to spin transport in Si [31][32][33][34][35][36][37][38][39], but this was typically done with ohmic FM-Si contacts and two-terminal magnetoresistance measurements or in transistor-type devices [40,41], which are bound to fail owing to the 'fundamental obstacle' for ohmic spin injection mentioned in §1 [1][2][3][4]. Although weak spin-valve effects are often presented, no evidence of spin precession is available so the signals measured are ambiguous at best [42,43].…”
Section: Spins In Siliconmentioning
confidence: 99%
“…Spin MOSFETs, 1,2) in which the source and drain are ferromagnetic materials, are promising devices because of their compatibility with existing semiconductor technologies and their applicability to non-volatile logic systems. [3][4][5][6][7] In comparison with other spintronics devices proposed so far, the amplification capability of spin MOSFETs is a distinctive characteristic and is indispensable for integrated circuit applications. The basic requirement for the operation of spin MOSFETs is to control the current by both the gate voltage and the magnetization configuration; however, spin relaxation, which occurs at the ferromagnet/ semiconductor interfaces and in the channel, has been a major obstacle, leading to extremely low magnetoresistance (MR) ratios of less than ∼0.1% at RT.…”
mentioning
confidence: 99%